<?xml version="1.0"?>
<feed xmlns="http://www.w3.org/2005/Atom" xml:lang="en">
	<id>https://wiki.libresilicon.com/api.php?action=feedcontributions&amp;feedformat=atom&amp;user=Leviathan</id>
	<title>LibreSilicon - User contributions [en]</title>
	<link rel="self" type="application/atom+xml" href="https://wiki.libresilicon.com/api.php?action=feedcontributions&amp;feedformat=atom&amp;user=Leviathan"/>
	<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Special:Contributions/Leviathan"/>
	<updated>2026-04-30T00:43:26Z</updated>
	<subtitle>User contributions</subtitle>
	<generator>MediaWiki 1.44.2</generator>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Danube_River&amp;diff=588</id>
		<title>Danube River</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Danube_River&amp;diff=588"/>
		<updated>2025-11-24T02:50:42Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Successful tapeouts */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;[https://gitlab.libresilicon.com/generator-tools/danube-river Danube River] is a tool, which generates you GDS2 files which you then can manufacture with your prototype process flow in order to validate parameters and adjust your recipes until the values are within a desired range.&lt;br /&gt;
&lt;br /&gt;
== Use cases ==&lt;br /&gt;
&lt;br /&gt;
=== Setting up a new fab ===&lt;br /&gt;
In case you wanna build a new factory, you basically tape out your Danube River layout over and over again while adjusting the recipes and design rules until the structures aren&#039;t broken anymore under the microscope and the values you measure match the predictions you&#039;ve calculated.&lt;br /&gt;
[[File:Danube For New Foundry.png|none|thumb|600x600px|Danube River flow for setting up a new fab]]&lt;br /&gt;
&lt;br /&gt;
=== Setting up support for an existing fab ===&lt;br /&gt;
In case you already have a working process and foundry available, but you&#039;re not sure that the timing characteristics they&#039;ve provided are accurate, you can use Danube River for extracting your own timing characteristics.&lt;br /&gt;
[[File:Danube For Existing Foundry.png|none|thumb|600x600px|Danube River flow for supporting existing process]]&lt;br /&gt;
&lt;br /&gt;
== Successful tapeouts ==&lt;br /&gt;
&lt;br /&gt;
So far, the only opportunity we had to try the new test layout generator, was with Global Foundries on their 180nm node, of which the result can be seen in the picture below:&lt;br /&gt;
[[File:Danube GF180.png|A successful tapeout with GF180|none|thumb|400x400px|alt=A successful tapeout with GF180]]The tapeout happened with the GDS2 files from the patch level at commit 42f33bb0988a81749da30af46769e721983bb5b1:&lt;br /&gt;
https://gitlab.libresilicon.com/generator-tools/danube-river/-/tree/42f33bb0988a81749da30af46769e721983bb5b1&lt;br /&gt;
&lt;br /&gt;
McMaster made a zoomable animated image where you even can zoom in so much that you can read the text&lt;br /&gt;
&lt;br /&gt;
https://siliconpr0n.org/map/efabless/gf180mcu-mpw18h1-18100001/mcmaster_mz_mit20x/#x=8416&amp;amp;y=11120&amp;amp;z=2&lt;br /&gt;
&lt;br /&gt;
== GDS2 view ==&lt;br /&gt;
The upper left section in the above image corresponds with the layout extracted from KLayout, when opening up the [https://gitlab.libresilicon.com/generator-tools/danube-river/-/blob/master/tapeout/gf180.gds?ref_type=heads layout used for the tape-out]&lt;br /&gt;
[[File:KLayout view- Danube GF180.png|none|thumb|500x500px|KLayout view of the Danube GF180 layout]]&lt;br /&gt;
&lt;br /&gt;
== Structures ==&lt;br /&gt;
The Danube test wafer has the purpose of allowing to characterize basic analog properties resulting from the manufacturing process flow.&lt;br /&gt;
&lt;br /&gt;
Each of those properties measured can be linked to a specific recipe in the process flow, which allows to fine tune a process and all its process recipes through repeatedly manufacturing and measuring the Danube river layout.&lt;br /&gt;
&lt;br /&gt;
The Danube river contains 3 types of devices, which allows you to determine edge parameters:&lt;br /&gt;
&lt;br /&gt;
* Resistors&lt;br /&gt;
* Capacitors&lt;br /&gt;
* Transistors&lt;br /&gt;
&lt;br /&gt;
=== Resistors ===&lt;br /&gt;
There&#039;s three types of resistive test structures on Danube River, due to variations in sheet resistance vs. area and length requirements.&lt;br /&gt;
&lt;br /&gt;
For each sheet resistance characterization there&#039;s each a vertical and horizontal configuration in order to catch any potential variance in sheet resistance due to the orientation, which might occur due to the crystal orientation of the substrate being used, like &amp;lt;100&amp;gt;, &amp;lt;110&amp;gt;, and &amp;lt;111&amp;gt;&amp;lt;ref&amp;gt;https://www.universitywafer.com/silicon-orientation.html&amp;lt;/ref&amp;gt;&lt;br /&gt;
&lt;br /&gt;
After having determined the voltage over each test resistor, when applying a constant current, the resistance can be calculated using simple Ohm&#039;s law &amp;lt;math&amp;gt;R={U \over I}&amp;lt;/math&amp;gt;&lt;br /&gt;
&lt;br /&gt;
==== Strip Resistors ====&lt;br /&gt;
The most simple form of a resistor simply is a straight sheet resistor between pad 1/2 and 3/4 for the vertical sheet resistance characterization and pad 1/4 to 2/3 for horizontal characterization respectively.[[File:Strip resistors.png|none|thumb|KLayout view of strip resistors]]The resistance is being measured by applying a constant current between two of the pads and measuring the voltage over the other two pads.&lt;br /&gt;
&lt;br /&gt;
Horizontal resistor: Apply constant current over 1 (one) and 2 (two), measure voltage over 4 (four) and 3 (three)&lt;br /&gt;
&lt;br /&gt;
Vertical resistor: Apply constant current over 2 (two) and 3 (three), measure voltage over 1 (one) and 4 (four)&lt;br /&gt;
&lt;br /&gt;
==== Small Meander Resistors ====&lt;br /&gt;
Danube River checks during generation whether the initial sheet resistance estimate in the initial calculated value map would result in a straight sheet resistor which still fits between the pads.&lt;br /&gt;
&lt;br /&gt;
If the target resistance of for instance 100 Ohms can not be fit between the pads using a straight resistor, Danube River will generate a Meander structure instead, which if small enough for fitting between the pads will be placed as shown below.[[File:Small Meander Resistors.png|none|thumb|KLayout view of Small Meander Resistors]]The resistance is being measured by applying a constant current between two of the pads and measuring the voltage over the other two pads.&lt;br /&gt;
&lt;br /&gt;
Horizontal resistor: Apply constant current over 2 (two) and 3 (three), measure voltage over 1 (one) and 4 (four)&lt;br /&gt;
&lt;br /&gt;
Vertical resistor: Apply constant current over 1 (one) and 2 (two), measure voltage over 4 (four) and 3 (three)&lt;br /&gt;
&lt;br /&gt;
==== Large Meander Resistors ====&lt;br /&gt;
[[File:Large Meander Resistors.png|none|thumb|KLayout view of Large Meander Resistors]]The resistance is being measured by applying a constant current between two of the pads and measuring the voltage over the other two pads.&lt;br /&gt;
&lt;br /&gt;
Horizontal resistor: Apply constant current over 1 (one) and 4 (four), measure voltage over 2 (two) and 3 (three)&lt;br /&gt;
&lt;br /&gt;
Vertical resistor: Apply constant current over 4 (four) and 3 (three), measure voltage over 1 (one) and 2 (two)&lt;br /&gt;
&lt;br /&gt;
=== Capacitors ===&lt;br /&gt;
Those capacitors are of interest when it comes to determining parasitic factors like leakage current as well as parasitic capacity between layers.&lt;br /&gt;
&lt;br /&gt;
The values extracted from measuring those structures will go into the optimization functions of the [[StdCellLib]] generator as well as the [[Pad Cell Generator]]&lt;br /&gt;
&lt;br /&gt;
Below some of the capacitors on the test wafer can be seen in more detail.&lt;br /&gt;
[[File:Capacitors in GDS2.png|none|frame|Closeup of capacitors in KLayout]]With each capacitor pad 3 (three) and 4 (four) are connected to one electrode, 1 (one) and 2 (two) to the second electrode.&lt;br /&gt;
&lt;br /&gt;
There&#039;s several ways of measuring the impedance of those structures,. Devices like keysight can directly measure the capacity and also an impedance vs. frequency curve.&lt;br /&gt;
&lt;br /&gt;
=== Transistors ===&lt;br /&gt;
On Danube River there are those very small structures connected the four pads, which for a change aren&#039;t connected and configured in a Kelvin configuration, because the pads go to source, drain, gate and bulk each.[[File:Transistor Structures.png|none|thumb|View of Transistor Structures in KLayout]]In the closeup below you can see an annotated zoom in onto one of the structures, with each contact being labeled. &lt;br /&gt;
[[File:Closeup FETs.png|none|thumb|Closeup FETs]]&lt;br /&gt;
Those structures are probably the most difficult ones to identify.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the smallest ones without any pads being shorted to each other with large strips.&lt;br /&gt;
&lt;br /&gt;
Simply use the Field Effect characterization function in your keysight or so and determine the gain and other values.&lt;br /&gt;
&lt;br /&gt;
The pad assignments are:&lt;br /&gt;
&lt;br /&gt;
# ONE: Source&lt;br /&gt;
# TWO: Gate&lt;br /&gt;
# THREE: Bulk&lt;br /&gt;
# FOUR: Drain&lt;br /&gt;
&lt;br /&gt;
== Setup and Generation ==&lt;br /&gt;
&lt;br /&gt;
You can either pull the latest Docker image, build your own Docker image using the Docker file linked below, or go through the Docker file and install the dependencies locally:&lt;br /&gt;
&lt;br /&gt;
https://gitlab.libresilicon.com/leviathan/docker-files/-/blob/master/tools/Dockerfile?ref_type=heads&amp;lt;nowiki/&amp;gt;&#039;&lt;br /&gt;
&lt;br /&gt;
A pre-built Docker image has been pushed to leviathan&#039;s Dockerhub, and can be retrieved by running&lt;br /&gt;
 docker pull leviathanch/libresilicon-tools:latest&lt;br /&gt;
In case you are adding a new technology node in [[LibrePDK]], it&#039;s better you install everything locally, make a pull request and wait until your technology node is being included in the Docker build&lt;br /&gt;
&lt;br /&gt;
Generating a new test wafer is as easy as providing it the wafer configuration as well as the name of the output GDSII file, it will also generate you a PDF with all the structures and info on how to measure it as well as a CSV file with the coordinates for automated measurement.&lt;br /&gt;
&lt;br /&gt;
Installing the dependencies, minus the LaTeX stuff (see the Docker file for it), basically goes something like&lt;br /&gt;
 python3 -m venv .venv&lt;br /&gt;
 . .venv/bin/activate&lt;br /&gt;
 pip install git+&amp;lt;nowiki&amp;gt;https://gitlab.libresilicon.com/generator-tools/librepdk.git&amp;lt;/nowiki&amp;gt;&lt;br /&gt;
 git clone &amp;lt;nowiki&amp;gt;https://gitlab.libresilicon.com/generator-tools/danube-river.git&amp;lt;/nowiki&amp;gt;&lt;br /&gt;
 cd danube-river &amp;amp;&amp;amp; pip install . &amp;amp;&amp;amp; cd ..&lt;br /&gt;
You can for instance run this command for generating the wafer for LS1U (LibreSilicon 1 micron)&lt;br /&gt;
 . .venv/bin/activate&lt;br /&gt;
 cd danube-river&lt;br /&gt;
 danube_generate -c configs/kacst-ls1u.cfg -o tapeout/kacst-ls1u.gds&lt;br /&gt;
&lt;br /&gt;
== Releases and pipelining ==&lt;br /&gt;
Check the pipeline artifacts for the most recent generation outputs from out GitLab CI/CD pipeline and see whether the foundry you wanna target already had a Danube River generated and one in tapeout.&lt;br /&gt;
&lt;br /&gt;
As soon as we get more than just GF180, for which we don&#039;t even have all the data, we will start providing pages with tables of all the measurements.&lt;br /&gt;
&lt;br /&gt;
https://gitlab.libresilicon.com/generator-tools/danube-river/-/pipelines/130&lt;br /&gt;
&lt;br /&gt;
== References ==&lt;br /&gt;
&amp;lt;references /&amp;gt;&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=586</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=586"/>
		<updated>2025-11-06T16:21:52Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: Integrated TikZ renderer is broken in newest MediaWiki&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the flowchart.&lt;br /&gt;
[[File:LS1U flow.png|none|thumb]]&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=File:LS1U_flow.png&amp;diff=585</id>
		<title>File:LS1U flow.png</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=File:LS1U_flow.png&amp;diff=585"/>
		<updated>2025-11-06T16:20:58Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;TikZ flow of LS1U&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=584</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=584"/>
		<updated>2025-11-06T16:13:17Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the flowchart.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Main_Page&amp;diff=583</id>
		<title>Main Page</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Main_Page&amp;diff=583"/>
		<updated>2025-10-12T16:07:40Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;This is the knowledge DB for the [[LibreSilicon stack]]&lt;br /&gt;
&lt;br /&gt;
Please check out the [[LibreSilicon stack]] here for an overview!!&lt;br /&gt;
&lt;br /&gt;
The official website can be found here under [https://libresilicon.com/ LibreSilicon]&lt;br /&gt;
&lt;br /&gt;
The LibreSilicon knowledge DB is holding [[chemical recipes]] as well as [[software tools]] needed to build free and open source semiconductors.&lt;br /&gt;
&lt;br /&gt;
As well as the [[Danube River]] test wafer, and it&#039;s precursor the [[Pearl River]]&lt;br /&gt;
&lt;br /&gt;
The process is flexible and can be implemented with various machines from various vendors.&lt;br /&gt;
&lt;br /&gt;
There&#039;s no need to have a very specific machine from a very specific vendor, as long as you&#039;re covering the [[Basic Tooling]] you should be ready to go.&lt;br /&gt;
&lt;br /&gt;
The LibrePDK contains tools for generating everything you need in order to generate fully functional chip design based on the design rules you provide and ship the GDS2 file to the factory for manufacturing:&lt;br /&gt;
&lt;br /&gt;
* The Standard Logic Cell generator (https://pdk.libresilicon.com/)&lt;br /&gt;
* The Pad Frame Generator which assembles the [[Pad Cell]] generated based on the design rules and timings provided, using the [[Pad Cell Generator]]&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Main_Page&amp;diff=582</id>
		<title>Main Page</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Main_Page&amp;diff=582"/>
		<updated>2025-10-12T16:07:07Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;This is the knowledge DB for the [[LibreSilicon stack]]&lt;br /&gt;
&lt;br /&gt;
Please check out the [[LibreSilicon stack]] here for an overview!!&lt;br /&gt;
&lt;br /&gt;
The official website can be found here under [https://libresilicon.com/ LibreSilicon]&lt;br /&gt;
&lt;br /&gt;
The LibreSilicon knowledge DB is holding [[chemical recipes]] as well as [[software tools]] needed to build free and open source semiconductors.&lt;br /&gt;
&lt;br /&gt;
As well as the [[Danube River]] test wafer, and it&#039;s precursor the [[Pearl River]]&lt;br /&gt;
&lt;br /&gt;
The process is flexible and can be implemented with various machines from various vendors.&lt;br /&gt;
&lt;br /&gt;
There&#039;s no need to have a very specific machine from a very specific vendor, as long as you&#039;re covering the [[Basic Tooling]] you should be ready to go.&lt;br /&gt;
&lt;br /&gt;
The LibrePDK contains tools for generating everything you need in order to generate fully functional chip design based on the design rules you provide and ship the GDS2 file to the factory for manufacturing:&lt;br /&gt;
&lt;br /&gt;
* The Standard Logic Cell generator (https://pdk.libresilicon.com/)&lt;br /&gt;
* The Pad Frame Generator which assembles the [[Index.php?title=PadCell|PadCells]] generated based on the design rules and timings provided, using the [[Pad Cell Generator]]&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Expert_Assessment_on_Bulk_Contact_Geometry_for_Multi-Fingered_MOSFET_P-Cells_in_LibrePDK&amp;diff=581</id>
		<title>Expert Assessment on Bulk Contact Geometry for Multi-Fingered MOSFET P-Cells in LibrePDK</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Expert_Assessment_on_Bulk_Contact_Geometry_for_Multi-Fingered_MOSFET_P-Cells_in_LibrePDK&amp;diff=581"/>
		<updated>2025-10-12T16:05:58Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: Created page with &amp;quot; == I. Introduction and Fundamental Role of the Bulk Terminal == The design of robust parameterized cells (P-cells) for integrated circuit development, particularly for wide, multi-fingered Metal-Oxide-Semiconductor Field-Effect Transistors (MOSFETs), hinges critically on controlling parasitic elements. Multi-fingered transistors are a common architectural choice in modern very large scale integration (VLSI) design, used primarily to achieve high current driving capabili...&amp;quot;&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;&lt;br /&gt;
== I. Introduction and Fundamental Role of the Bulk Terminal ==&lt;br /&gt;
The design of robust parameterized cells (P-cells) for integrated circuit development, particularly for wide, multi-fingered Metal-Oxide-Semiconductor Field-Effect Transistors (MOSFETs), hinges critically on controlling parasitic elements. Multi-fingered transistors are a common architectural choice in modern very large scale integration (VLSI) design, used primarily to achieve high current driving capability, reduce effective gate resistance (RG​), and lower parasitic Source/Drain (S/D) capacitance by distributing the total transistor width (W) into multiple smaller fingers.   &lt;br /&gt;
&lt;br /&gt;
=== The Bulk Terminal and Distributed Resistance ===&lt;br /&gt;
In bulk Complementary Metal-Oxide-Semiconductor (CMOS) processes, the bulk or body connection represents the fourth terminal of the transistor. For NMOS devices fabricated in a p-type substrate, the bulk must be tied to the lowest potential (ground or VSS​). Conversely, PMOS devices, situated within an n-well, require the n-well (bulk) to be tied to the highest potential (VDD​).   &lt;br /&gt;
&lt;br /&gt;
The physical location and geometry of the ohmic contact placed to establish this bulk connection profoundly influence device stability and performance. Bulk resistance (RBulk​), or well resistance (RNWell​), represents the distributed resistive path from the active channel region to the metallic contact point. This resistance is not a simple lumped component but a complex network of distributed resistors, often modeled in simplified circuits as lumped resistances (rD​ and rS​) connected through the substrate network. For any wide transistor, minimizing and stabilizing this distributed RBulk​ is paramount.   &lt;br /&gt;
&lt;br /&gt;
=== Comparative Architectures: Single Contact vs. Perimeter Ring ===&lt;br /&gt;
The inquiry compares two distinct bulk contact geometries for a wide, multi-fingered FET:&lt;br /&gt;
&lt;br /&gt;
# &#039;&#039;&#039;Single Localized Contact (Image 1):&#039;&#039;&#039; This approach places a single, small contact, typically situated along one edge of the wide device diffusion. While maximizing layout density and minimizing area overhead, this geometry creates the longest possible resistive path between the active channel regions farthest from the contact and the supply rail.&lt;br /&gt;
# &#039;&#039;&#039;Perimeter Contact Ring (Image 2):&#039;&#039;&#039; This geometry mandates a diffusion enclosure (a guard ring) completely surrounding the active transistor fingers. This structure provides a low-impedance, distributed connection that shunts current away from the channel region and stabilizes the bulk potential across the entire device width.&lt;br /&gt;
&lt;br /&gt;
The single localized contact fundamentally violates a core principle of wide-device optimization: the efficient distribution and minimization of critical parasitic elements. Just as multiple gate fingers are used to lower RG​ and reduce parasitics, the bulk contact structure for a wide device must distribute the low-resistance connection to ensure uniform potential across the channel. This structural shortcoming makes the single contact inadequate for high-performance contexts. Consequently, the choice between the two architectures is a trade-off between minimal area (Image 1) and robust electrical integrity and reliability (Image 2).&lt;br /&gt;
&lt;br /&gt;
== II. Electrical and Performance Analysis: RBulk​ and Analog Quality ==&lt;br /&gt;
The resistance associated with the bulk connection directly impacts two critical aspects of MOSFET performance: DC stability via the body effect and high-precision operation, such as device matching.&lt;br /&gt;
&lt;br /&gt;
=== A. DC Performance Degradation: The Body Effect and VTH​ Modulation ===&lt;br /&gt;
The threshold voltage (VTH​) of a MOSFET is not fixed but is modulated by the potential difference between the source and the bulk (body), VSB​. This phenomenon, known as the body effect or back-gate effect, is quantitatively described by the relationship VTH​=VTH0​+γ(∣2ϕF​+VSB​∣​−∣2ϕF​∣​). Here, γ is the body-effect coefficient.   &lt;br /&gt;
&lt;br /&gt;
In an ideal scenario, the source is directly tied to the bulk (VSB​=0), minimizing this effect. However, high RBulk​ introduces several problems:&lt;br /&gt;
&lt;br /&gt;
# &#039;&#039;&#039;Resistive Voltage Drop (ΔVBulk​):&#039;&#039;&#039; When any DC current (such as substrate leakage or carrier recombination current) flows from the channel region toward the single, localized bulk contact, it produces a voltage drop, ΔVBulk​=IBulk​⋅RBulk​. If RBulk​ is high, this drop becomes significant, meaning the local potential seen by the channel, VB,local​, deviates from the intended VSS​ or VDD​ reference.   &lt;br /&gt;
# &#039;&#039;&#039;Dynamic VTH​ Shift:&#039;&#039;&#039; This resistive drop results in a non-zero VSB​ for the active channel region, particularly for fingers located far from the bulk contact. The resultant shift in VTH​  means the electrical behavior of the transistor is non-uniform across its width and is subject to dynamic fluctuations proportional to the injected bulk current.   &lt;br /&gt;
&lt;br /&gt;
The perimeter contact ring solves this by providing a comprehensive, low-impedance path to the supply rail. This ensures that VBulk​≈VSS​ (or VDD​), stabilizing VSB​ close to zero (or the intended fixed value) across the entire device width. This structural choice is necessary to eliminate dynamic VTH​ modulation caused by internal DC current flow.&lt;br /&gt;
&lt;br /&gt;
=== B. Transistor Matching and Precision Analog Circuits ===&lt;br /&gt;
In precision analog blocks, such as current mirrors and differential pairs, matching between identically designed transistors is essential. Matching is defined as the differential performance between two or more devices on the same chip. The efficacy of analog circuits is often limited by device mismatch.   &lt;br /&gt;
&lt;br /&gt;
The use of a single, localized bulk contact structure introduces a systematic variation in RBulk​ across the width of the multi-fingered device. The fingers nearest the contact have a low RBulk​, while those centrally located or farthest away have a maximal RBulk​. This RBulk​ gradient creates a predictable, systematic gradient in the effective VTH​ across the device width.   &lt;br /&gt;
&lt;br /&gt;
Systematic variations are particularly detrimental because they cannot be mitigated by simply increasing device area, unlike random dopant fluctuations. If two halves of a differential pair utilize wide FETs with single localized contacts, the non-uniform VTH​ profile translates directly into increased offset voltage and current mismatch (ΔI), severely degrading the performance of the analog block.   &lt;br /&gt;
&lt;br /&gt;
The perimeter contact ring, by establishing a uniform, low-resistance bulk potential, ensures high internal symmetry. This structural uniformity minimizes the systematic, width-dependent VTH​ variation, which is a prerequisite for achieving the high level of matching required for sensitive analog circuits. Therefore, for any precision analog design utilizing wide FETs, the single contact is technically inappropriate due to the systematic mismatch it inherently creates.   &lt;br /&gt;
&lt;br /&gt;
The non-linear fluctuations in VTH​ caused by high RBulk​ also influence the overall transconductance (gm​) characteristics of the device. This indirect non-linear modification can lead to measurable degradation in signal integrity, often resulting in increased Total Harmonic Distortion (THD) and a reduction in amplifier linearity.   &lt;br /&gt;
&lt;br /&gt;
The operational differences summarized in the comparison table illustrate why the perimeter approach is mandatory for non-trivial applications.&lt;br /&gt;
&lt;br /&gt;
Table 1: Comparative Analysis of Bulk Contact Geometries for Multi-Finger FETs&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot;&lt;br /&gt;
|&#039;&#039;&#039;Design Metric&#039;&#039;&#039;&lt;br /&gt;
|&#039;&#039;&#039;Single Localized Bulk Contact (Image 1)&#039;&#039;&#039;&lt;br /&gt;
|&#039;&#039;&#039;Perimeter Bulk Contact Ring (Image 2)&#039;&#039;&#039;&lt;br /&gt;
|-&lt;br /&gt;
|&#039;&#039;&#039;Effective RBulk&#039;&#039;&#039;​&lt;br /&gt;
|High, non-uniform across the channel width.&lt;br /&gt;
|Significantly low, uniform current path, minimized voltage gradients.&lt;br /&gt;
|-&lt;br /&gt;
|&#039;&#039;&#039;Body Effect Control&#039;&#039;&#039;&lt;br /&gt;
|Poor control; high RBulk​ exacerbates VTH​ variations (body effect).&lt;br /&gt;
|Excellent control; stabilized body potential reduces γ impact, ensuring uniform VTH​.&lt;br /&gt;
|-&lt;br /&gt;
|&#039;&#039;&#039;DC/Analog Matching&#039;&#039;&#039;&lt;br /&gt;
|Poor; introduces systematic VTH​ and gm​ gradients across fingers.&lt;br /&gt;
|Excellent; layout is symmetric and potential is uniform.&lt;br /&gt;
|-&lt;br /&gt;
|&#039;&#039;&#039;Area Efficiency&#039;&#039;&#039;&lt;br /&gt;
|Maximal area efficiency (smallest footprint).&lt;br /&gt;
|Reduced efficiency; significant area overhead due to enclosure.&lt;br /&gt;
|}&lt;br /&gt;
  &lt;br /&gt;
&lt;br /&gt;
== III. Reliability Assessment: Latchup Suppression (The Primary Driver) ==&lt;br /&gt;
For any P-cell intended for wide reuse in a PDK, reliability requirements, particularly latchup immunity, must dictate the bulk contact geometry. Latchup is a destructive failure mode unique to bulk CMOS structures.&lt;br /&gt;
&lt;br /&gt;
=== A. The Mechanism of Latchup Triggering ===&lt;br /&gt;
The latchup mechanism involves the activation of a parasitic four-layer pnpn structure, which forms a Silicon Controlled Rectifier (SCR) between the VDD​ and VSS​ power rails. This parasitic SCR is composed of the inherent NPN and PNP bipolar junction transistors (BJTs) formed by the alternating source/drain diffusions and wells/substrate.   &lt;br /&gt;
&lt;br /&gt;
Latchup is triggered when a transient event (e.g., Electrostatic Discharge (ESD), power rail glitches, or noise) injects current into the structure. This injected current must flow through the parasitic resistance of the substrate (RSubstrate​) or the N-well (RNWell​). If the voltage drop across these parasitic resistors (I⋅R) is large enough, it can forward-bias the base-emitter junction of the parasitic BJTs (typically around 0.7V), initiating positive feedback and causing the SCR to latch into a low-impedance, high-current state that persists even after the trigger is removed and can lead to thermal destruction of the device.   &lt;br /&gt;
&lt;br /&gt;
=== B. Failure of the Single Contact Architecture ===&lt;br /&gt;
The high and non-uniform RBulk​ inherent in the single localized contact geometry (Image 1) makes it highly susceptible to latchup. Since the single contact represents a high-resistance path for carrier collection, even moderate transient currents injected from nearby noisy sources or device self-heating (impact ionization) can create a substantial voltage drop (ΔVBulk​) across the bulk resistance. This easily exceeds the trigger voltage required to turn on the parasitic BJT.&lt;br /&gt;
&lt;br /&gt;
Moreover, a small, localized bulk contact is fundamentally incapable of efficiently collecting or shunting minority carriers generated in the silicon far from the contact point. Inadequate current shunting capacity means that the base current necessary to trigger the parasitic BJT is allowed to flow, rather than being diverted immediately to the power rail.   &lt;br /&gt;
&lt;br /&gt;
=== C. Perimeter Contact Rings for Robust Latchup Mitigation ===&lt;br /&gt;
The perimeter contact ring is a standard industry technique for achieving high latchup robustness, often referred to as a guard ring structure. It functions as a low-impedance shunt path connected strongly to VSS​ (for NMOS/P-substrate) or VDD​ (for PMOS/N-well).   &lt;br /&gt;
&lt;br /&gt;
The effectiveness of the guard ring is based on two primary mechanisms:&lt;br /&gt;
&lt;br /&gt;
# &#039;&#039;&#039;Reduced Parasitic Resistance:&#039;&#039;&#039; By providing a continuous, high-density connection to the supply rail surrounding the active device, the perimeter ring effectively adds massive parallel resistance to the parasitic substrate and well resistors, dramatically reducing RSubstrate​ and RNWell​. This reduction minimizes the I⋅R drop across the silicon during transient events, ensuring the parasitic BJT junctions are not forward-biased.   &lt;br /&gt;
# &#039;&#039;&#039;Carrier Diversion and Shunting:&#039;&#039;&#039; The guard ring acts as a majority carrier syphon. In the event of carrier injection, the guard ring quickly diverts the collector current away from the base of the parasitic BJT. This prevents the positive feedback loop necessary for the SCR structure to latch, maintaining the stability of the bulk/well potentials around VSS​ or VDD​.   &lt;br /&gt;
&lt;br /&gt;
For any P-cell intended for deployment in a general-purpose PDK like LibrePDK, where the operating environment (mixed-signal, high dI/dt switching) is unknown, reliability must take precedence over minimal area consumption. Latchup is a destructive failure mechanism , and the minor area penalty incurred by the perimeter ring is an acceptable, and indeed mandatory, cost to ensure immunity against catastrophic failure.   &lt;br /&gt;
&lt;br /&gt;
== IV. Advanced High-Frequency and Mixed-Signal Concerns ==&lt;br /&gt;
In modern System-on-Chip (SoC) architectures, analog and digital blocks are integrated on the same monolithic substrate. This necessitates stringent isolation requirements, which are also profoundly affected by the bulk contact geometry.&lt;br /&gt;
&lt;br /&gt;
=== A. Substrate Noise Coupling Dynamics ===&lt;br /&gt;
In typical lightly doped bulk CMOS processes (resistivity around 12Ω-cm in some cases ), the silicon substrate acts as a shared, conductive medium, facilitating the coupling of noise from aggressive switching circuits (digital logic) to sensitive victim circuits (e.g., Low Noise Amplifiers, LNAs). Noise is injected into the substrate via ground/power rails and device junction capacitances during switching.   &lt;br /&gt;
&lt;br /&gt;
The critical path for substrate noise impacting a sensitive MOSFET is through the modulation of the bulk potential. Noise currents propagate through the distributed bulk resistance network and appear as voltage fluctuations (ΔVBulk​) at the channel interface. These fluctuations dynamically modulate the threshold voltage (VTH​) via the body effect. This dynamic VTH​ modulation introduces significant performance degradation, including timing jitter, reduced Power Supply Rejection Ratio (PSSR), and an increase in the overall circuit noise figure.   &lt;br /&gt;
&lt;br /&gt;
=== B. Guard Ring Efficacy in Noise Isolation ===&lt;br /&gt;
The perimeter contact ring provides a vital high-frequency function: it acts as a low-impedance AC ground for the local device well/substrate, essential for noise isolation.   &lt;br /&gt;
&lt;br /&gt;
The mechanism involves two key actions:&lt;br /&gt;
&lt;br /&gt;
# &#039;&#039;&#039;Filtering and Syphoning:&#039;&#039;&#039; The guard ring structure provides a localized, low-resistance path to the supply ground for high-frequency substrate currents. The presence of this low-impedance boundary filters the substrate noise before it can significantly couple into the sensitive FET channel.   &lt;br /&gt;
# &#039;&#039;&#039;Vertical Current Minimization:&#039;&#039;&#039; Effective isolation is achieved by creating a strong reference potential (ground) that surrounds the sensitive circuit. This minimizes the vertical current paths that substrate noise must take to reach the channel region, diverting lateral current flow to the guard ring instead.   &lt;br /&gt;
&lt;br /&gt;
A single localized bulk contact offers virtually no benefit in high-frequency noise isolation. Noise injected from distant aggressors can easily propagate underneath the wide device and capacitively couple into the channel potential due to the high impedance of the localized contact structure.   &lt;br /&gt;
&lt;br /&gt;
The distributed perimeter bulk contact fulfills a critical dual requirement in mixed-signal design: it ensures a stable DC reference for the body effect (mitigating systematic mismatch) and provides a low-impedance AC ground path for high-frequency noise isolation (mitigating dynamic performance degradation). This unified function underscores the necessity of the perimeter structure for robust P-cell design in a high-integration environment.&lt;br /&gt;
&lt;br /&gt;
Table 2 highlights the severe consequences of neglecting the bulk connection in performance-critical applications.&lt;br /&gt;
&lt;br /&gt;
Table 2: Electrical Consequences of High RBulk​ in Analog FETs&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot;&lt;br /&gt;
|&#039;&#039;&#039;Affected Parameter&#039;&#039;&#039;&lt;br /&gt;
|&#039;&#039;&#039;Degradation Mechanism&#039;&#039;&#039;&lt;br /&gt;
|&#039;&#039;&#039;Impact on Circuit Performance&#039;&#039;&#039;&lt;br /&gt;
|&#039;&#039;&#039;Reference&#039;&#039;&#039;&lt;br /&gt;
|-&lt;br /&gt;
|&#039;&#039;&#039;Threshold Voltage (VTH​)&#039;&#039;&#039;&lt;br /&gt;
|Fluctuations in VSB​ due to resistive drop, driving the Body Effect.&lt;br /&gt;
|Reduced DC operating point stability and predictability.&lt;br /&gt;
|&lt;br /&gt;
|-&lt;br /&gt;
|&#039;&#039;&#039;Device Matching&#039;&#039;&#039;&lt;br /&gt;
|Non-uniform voltage distribution (gradient) across the wide device width.&lt;br /&gt;
|Increased offset voltage and current mismatch in differential pairs/current mirrors.&lt;br /&gt;
|&lt;br /&gt;
|-&lt;br /&gt;
|&#039;&#039;&#039;Linearity (THD)&#039;&#039;&#039;&lt;br /&gt;
|Non-linear body potential variations (indirect VGeff​ change).&lt;br /&gt;
|Reduction in effective transconductance (gm​); increased Total Harmonic Distortion (THD).&lt;br /&gt;
|&lt;br /&gt;
|-&lt;br /&gt;
|&#039;&#039;&#039;Power Supply Rejection (PSSR)&#039;&#039;&#039;&lt;br /&gt;
|Substrate noise coupling from supplies propagates to the channel.&lt;br /&gt;
|Decreased isolation between supply rails and signal path; increased jitter and noise figure.&lt;br /&gt;
|&lt;br /&gt;
|-&lt;br /&gt;
|&#039;&#039;&#039;Latchup Trigger Margin&#039;&#039;&#039;&lt;br /&gt;
|Inadequate shunting path leads to critical voltage drop across parasitic resistors.&lt;br /&gt;
|Decreased ESD/transient robustness; risk of catastrophic failure.&lt;br /&gt;
|&lt;br /&gt;
|}&lt;br /&gt;
  &lt;br /&gt;
&lt;br /&gt;
== V. Layout and Physical Implementation Trade-Offs for LibrePDK ==&lt;br /&gt;
The physical implementation of wide transistors must balance electrical requirements with practical layout constraints, including area, density, and manufacturability.&lt;br /&gt;
&lt;br /&gt;
=== A. Distributed Contacting and Finger Count Limits ===&lt;br /&gt;
The principle of maintaining low, uniform RBulk​ places practical constraints on the maximum width a transistor can achieve before requiring dedicated taps. Industry PDKs often establish explicit design rules limiting the maximum number of fingers (Nf​) that may share a single bulk pick-up ring or tap structure, recognizing the distributed nature of the bulk resistance.   &lt;br /&gt;
&lt;br /&gt;
For example, detailed guidelines in other open-source PDK documents recommend that a multi-finger transistor should utilize a pick-up ring structure, limiting the &#039;&#039;recommended&#039;&#039; number of fingers sharing one ring to 8, with a &#039;&#039;maximum&#039;&#039; limit of 16 fingers. The wide, multi-fingered device shown in Image 1 (which contains many fingers) relies on a single localized contact. Even if this single contact were physically expanded, it would still represent a point source of charge collection and likely violate the spirit, if not the letter, of these established PDK guidelines intended to cap RBulk​.   &lt;br /&gt;
&lt;br /&gt;
The perimeter ring inherently provides continuous, distributed contact access, effectively satisfying the need to limit Nf​ between access points. For extremely wide devices, this perimeter ring should be supplemented by internal bulk ties (contacts placed in the shared S/D diffusions) to further reduce RBulk​ and maintain uniform potential across the entire structure.&lt;br /&gt;
&lt;br /&gt;
=== B. Area Efficiency and Density Management ===&lt;br /&gt;
The main drawback of the perimeter contact ring is the consequential area overhead. The full enclosure requires significant area for the tap diffusion, the necessary spacing rules, and the high density of contacts/vias required to connect the ring to the metal power net.   &lt;br /&gt;
&lt;br /&gt;
However, this area penalty offers concomitant benefits for Design for Manufacturability (DFM). For a P-cell, robustness must be defined by structural redundancy. DFM rules often require the use of multiple contacts or vias instead of single points of connection to enhance reliability and prevent yield loss due to contact or via failures. A perimeter ring naturally incorporates high contact density, which minimizes localized contact resistance (RC​) and provides redundancy against manufacturing defects.   &lt;br /&gt;
&lt;br /&gt;
Furthermore, the highly repetitive, geometric structure of a perimeter contact ring aids in managing metal and via density uniformity. Uniform density is crucial for consistent manufacturing processes, particularly Chemical-Mechanical Planarization (CMP), which, if inconsistent, can lead to non-uniform etching and stress-related defects, ultimately hurting fabrication yield. The inclusion of a dense, perimeter structure, although increasing the total area, contributes to better overall manufacturing consistency.   &lt;br /&gt;
&lt;br /&gt;
For robust P-cell definition, the structure must incorporate the active area and the necessary protection/taps. The perimeter ring thus defines the minimal, reliable physical boundary of the multi-fingered device, ensuring adherence to fundamental reliability and performance standards simultaneously.&lt;br /&gt;
&lt;br /&gt;
== VI. Synthesis, Conclusion, and Actionable Recommendations for LibrePDK ==&lt;br /&gt;
The choice between a single localized bulk contact and a perimeter bulk contact ring for wide, multi-fingered MOSFET P-cells is a fundamental decision regarding design robustness. The analysis confirms that while the single contact (Image 1) saves valuable silicon area, it introduces profound systematic limitations in electrical performance and unacceptable risks to device reliability.&lt;br /&gt;
&lt;br /&gt;
The single localized contact results in high, non-uniform bulk resistance (RBulk​), leading to systematic mismatch via body-effect gradients, reduced linearity, and extreme susceptibility to latchup and substrate noise coupling.&lt;br /&gt;
&lt;br /&gt;
The perimeter bulk contact ring (Image 2), acting as a majority carrier guard ring, is a mandatory structure for any multi-fingered FET used in analog, RF, I/O, or high-current applications. This structure provides a low-impedance path that stabilizes the body potential (eliminating systematic VTH​ gradients), shunts minority carriers (preventing latchup), and acts as a localized AC ground (reducing substrate noise coupling).&lt;br /&gt;
&lt;br /&gt;
=== Actionable Recommendations for LibrePDK P-Cell Implementation ===&lt;br /&gt;
To ensure that the multi-fingered FET P-cells in LibrePDK are robust, reusable, and compliant with industry standards for high-performance design, the following architectural mandates should be adopted:&lt;br /&gt;
&lt;br /&gt;
# &#039;&#039;&#039;Mandate Full Perimeter Enclosure:&#039;&#039;&#039; The standard P-cell definition for multi-fingered MOSFETs must enforce a complete, fully contacted perimeter diffusion around the entire active region, connected to the appropriate supply rail (VSS​ or VDD​). This full enclosure is essential for guaranteeing minimum latchup robustness and maximizing noise isolation, serving as the defining, robust physical boundary of the P-cell.   &lt;br /&gt;
# &#039;&#039;&#039;Adhere to Distributed Resistance Limits (Nf​):&#039;&#039;&#039; For wide devices, the design structure must implicitly or explicitly limit the maximum number of fingers (Nf​) that rely on a single, isolated tap access point. If the perimeter ring is relied upon, its contact density must be sufficient to maintain low RBulk​ uniformly. The adoption of guidelines limiting Nf​ to a maximum of 16 (or preferably 8 for precision analog) between major pick-up structures is recommended to maintain stable VTH​ and matching across the device width.   &lt;br /&gt;
# &#039;&#039;&#039;Prioritize Contact Density for Reliability:&#039;&#039;&#039; The perimeter ring must utilize the highest possible contact and via density allowed by the Design Rule Checks (DRC). This not only minimizes RBulk​ but also aligns with DFM principles, enhancing P-cell reliability against electromigration and ensuring improved manufacturing yield through redundant connections.   &lt;br /&gt;
# &#039;&#039;&#039;Verification Requirements:&#039;&#039;&#039; The PDK should include automated checks (DRC/LVS) to verify the full enclosure and minimum contact density of the perimeter ring. Furthermore, P-cell characterization should ideally involve post-layout simulation or parameter extraction estimating the distributed RBulk​ to confirm that the parasitic voltage drop across the widest point of the channel remains negligible under maximum operational current conditions.&lt;br /&gt;
&lt;br /&gt;
Table 3: Recommended Bulk Contact Constraints based on PDK Precedents for LibrePDK&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot;&lt;br /&gt;
|&#039;&#039;&#039;PDK Design Parameter&#039;&#039;&#039;&lt;br /&gt;
|&#039;&#039;&#039;Requirement&#039;&#039;&#039;&lt;br /&gt;
|&#039;&#039;&#039;Rationale&#039;&#039;&#039;&lt;br /&gt;
|&#039;&#039;&#039;Reference&#039;&#039;&#039;&lt;br /&gt;
|-&lt;br /&gt;
|&#039;&#039;&#039;Contact Geometry&#039;&#039;&#039;&lt;br /&gt;
|Complete perimeter diffusion ring encompassing the active transistor area.&lt;br /&gt;
|Provides full latchup protection (carrier shunting) and robust noise isolation (AC grounding).&lt;br /&gt;
|&lt;br /&gt;
|-&lt;br /&gt;
|&#039;&#039;&#039;Max Fingers per Tap (Nf​)&#039;&#039;&#039;&lt;br /&gt;
|Recommended: ≤8 fingers between main taps. Maximum: ≤16 fingers.&lt;br /&gt;
|Maintains low, uniform RBulk​ across the wide device width to stabilize VTH​ and ensure matching.&lt;br /&gt;
|&lt;br /&gt;
|-&lt;br /&gt;
|&#039;&#039;&#039;Contact Density&#039;&#039;&#039;&lt;br /&gt;
|Maximum allowable contact/via density within the tap area.&lt;br /&gt;
|Minimizes localized contact resistance (RC​) and improves reliability against electromigration (EMIR) and DFM defects.&lt;br /&gt;
|&lt;br /&gt;
|-&lt;br /&gt;
|&#039;&#039;&#039;Metal Connection&#039;&#039;&#039;&lt;br /&gt;
|Low-resistance metal routing surrounding the tap diffusion, connected at multiple points to the global supply/ground net.&lt;br /&gt;
|Ensures the distributed taps are consolidated into a single, robust, low-impedance reference potential.&lt;br /&gt;
|}&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Fingered_Transistors&amp;diff=580</id>
		<title>Fingered Transistors</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Fingered_Transistors&amp;diff=580"/>
		<updated>2025-10-12T16:05:04Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;Fingers involve splitting a single large transistor into multiple smaller transistors (or “fingers”) and connecting them in parallel.&lt;br /&gt;
&lt;br /&gt;
Instead of having one large transistor, the width is divided into several parts.&lt;br /&gt;
&lt;br /&gt;
Each finger shares a common gate but has separate source and drain regions.&lt;br /&gt;
&lt;br /&gt;
The Bulk/Substrate contact is a ring, also known as a guard ring. The reason making the bulk contact surround the transistor, has been nicely elaborated by Gemini&amp;lt;ref&amp;gt;[[Analysis: Single Bulk Contact vs. Bulk Contact Ring for a FET]]&amp;lt;/ref&amp;gt;&amp;lt;ref&amp;gt;[[Expert Assessment on Bulk Contact Geometry for Multi-Fingered MOSFET P-Cells in LibrePDK]]&amp;lt;/ref&amp;gt;.&lt;br /&gt;
&lt;br /&gt;
[[File:Layout-of-multi-finger-RF-transistors-with-variable-L-f-5-011-018-025-045-1-2.png|none|frame|Fingered transistor layout example]]&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Fingered_Transistors&amp;diff=579</id>
		<title>Fingered Transistors</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Fingered_Transistors&amp;diff=579"/>
		<updated>2025-10-12T16:04:43Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;Fingers involve splitting a single large transistor into multiple smaller transistors (or “fingers”) and connecting them in parallel.&lt;br /&gt;
&lt;br /&gt;
Instead of having one large transistor, the width is divided into several parts.&lt;br /&gt;
&lt;br /&gt;
Each finger shares a common gate but has separate source and drain regions.&lt;br /&gt;
&lt;br /&gt;
The Bulk/Substrate contact is a ring, also known as a guard ring. The reason making the bulk contact surround the transistor, has been nicely elaborated by Gemini&amp;lt;ref&amp;gt;[[Analysis: Single Bulk Contact vs. Bulk Contact Ring for a FET]]&amp;lt;/ref&amp;gt;&amp;lt;ref&amp;gt;Expert Assessment on Bulk Contact Geometry for Multi-Fingered MOSFET P-Cells in LibrePDK&amp;lt;/ref&amp;gt;.&lt;br /&gt;
&lt;br /&gt;
[[File:Layout-of-multi-finger-RF-transistors-with-variable-L-f-5-011-018-025-045-1-2.png|none|frame|Fingered transistor layout example]]&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Analysis:_Single_Bulk_Contact_vs._Bulk_Contact_Ring_for_a_FET&amp;diff=578</id>
		<title>Analysis: Single Bulk Contact vs. Bulk Contact Ring for a FET</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Analysis:_Single_Bulk_Contact_vs._Bulk_Contact_Ring_for_a_FET&amp;diff=578"/>
		<updated>2025-10-12T16:04:03Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: Created page with &amp;quot;This document analyzes the trade-offs between using a single, small bulk contact versus a continuous bulk contact ring (guard ring) around a Field-Effect Transistor (FET). The choice significantly impacts area, performance, and reliability.  === Key Concepts ===  * &amp;#039;&amp;#039;&amp;#039;Bulk (or Body):&amp;#039;&amp;#039;&amp;#039; The underlying silicon substrate on which the transistor is built. It must be tied to a stable voltage potential (e.g., VSS for NMOS, VDD for PMOS). * &amp;#039;&amp;#039;&amp;#039;Bulk Contact:&amp;#039;&amp;#039;&amp;#039; The physical con...&amp;quot;&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;This document analyzes the trade-offs between using a single, small bulk contact versus a continuous bulk contact ring (guard ring) around a Field-Effect Transistor (FET). The choice significantly impacts area, performance, and reliability.&lt;br /&gt;
&lt;br /&gt;
=== Key Concepts ===&lt;br /&gt;
&lt;br /&gt;
* &#039;&#039;&#039;Bulk (or Body):&#039;&#039;&#039; The underlying silicon substrate on which the transistor is built. It must be tied to a stable voltage potential (e.g., VSS for NMOS, VDD for PMOS).&lt;br /&gt;
* &#039;&#039;&#039;Bulk Contact:&#039;&#039;&#039; The physical connection (via metal and contacts) from the supply rails to the bulk.&lt;br /&gt;
* &#039;&#039;&#039;Body Effect:&#039;&#039;&#039; The change in a transistor&#039;s threshold voltage () caused by a voltage difference between its source and bulk (VBS​). A well-connected bulk minimizes this effect.&lt;br /&gt;
* &#039;&#039;&#039;Latch-up:&#039;&#039;&#039; A catastrophic short-circuit condition in CMOS circuits caused by the triggering of parasitic bipolar structures. Proper bulk contacts are the primary defense against latch-up.&lt;br /&gt;
* &#039;&#039;&#039;Substrate Noise:&#039;&#039;&#039; Unwanted electrical noise coupled through the silicon substrate, which can degrade the performance of sensitive analog circuits.&lt;br /&gt;
&lt;br /&gt;
== Comparison of Approaches ==&lt;br /&gt;
Here is a side-by-side comparison of the two layout styles you&#039;re considering.&lt;br /&gt;
&lt;br /&gt;
=== 1. Single Bulk Contact (Your Current Design) ===&lt;br /&gt;
This approach prioritizes layout density by placing one or a few discrete contacts near the active device area.&lt;br /&gt;
&lt;br /&gt;
==== &#039;&#039;&#039;Pros:&#039;&#039;&#039; ====&lt;br /&gt;
&lt;br /&gt;
* &#039;&#039;&#039;✅ High Area Efficiency:&#039;&#039;&#039; This is the biggest advantage. It consumes minimal silicon area, allowing for a denser overall chip layout and lower cost.&lt;br /&gt;
* &#039;&#039;&#039;✅ Simpler Layout &amp;amp; Routing:&#039;&#039;&#039; It is faster to draw and requires less complex routing to connect to the power rails.&lt;br /&gt;
&lt;br /&gt;
==== &#039;&#039;&#039;Cons:&#039;&#039;&#039; ====&lt;br /&gt;
&lt;br /&gt;
* &#039;&#039;&#039;❌ High Substrate Resistance:&#039;&#039;&#039; The electrical path from the farthest parts of the transistor&#039;s channel to the single contact point is long and resistive.&lt;br /&gt;
* &#039;&#039;&#039;❌ Increased Body Effect:&#039;&#039;&#039; During operation, current flowing through the substrate resistance can cause the local bulk potential to rise, increasing the voltage between the bulk and source (VBS​). This raises the transistor&#039;s threshold voltage, degrading its performance (e.g., lower drive current) in an unpredictable way.&lt;br /&gt;
* &#039;&#039;&#039;❌ Poor Latch-up Immunity:&#039;&#039;&#039; This is a major reliability risk. The high resistance makes it difficult to sink the stray currents that can trigger a latch-up event. The device is significantly more susceptible to latch-up.&lt;br /&gt;
* &#039;&#039;&#039;❌ Susceptibility to Noise:&#039;&#039;&#039; The device is more vulnerable to noise injected into the substrate from neighboring circuits. It also provides a poor shield, meaning this transistor&#039;s switching can more easily inject noise that affects other components.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;When to Use:&#039;&#039;&#039; This style is acceptable for small, non-critical transistors inside a digital standard cell library where density is the absolute priority and where the overall substrate connection strategy (e.g., a grid of taps across the floorplan) mitigates the risk.&lt;br /&gt;
&lt;br /&gt;
=== 2. Bulk Contact Ring (Guard Ring) ===&lt;br /&gt;
This approach surrounds the entire transistor with a continuous, well-connected ring tied to the bulk potential.&lt;br /&gt;
&lt;br /&gt;
==== &#039;&#039;&#039;Pros:&#039;&#039;&#039; ====&lt;br /&gt;
&lt;br /&gt;
* &#039;&#039;&#039;✅ Excellent Latch-up Immunity:&#039;&#039;&#039; The low-resistance ring provides a highly effective &amp;quot;moat&amp;quot; that collects and shunts stray currents to the supply rail, offering robust protection against latch-up.&lt;br /&gt;
* &#039;&#039;&#039;✅ Minimized Body Effect:&#039;&#039;&#039; The ring ensures the bulk potential across the entire device is held firmly at the supply voltage. This results in a stable threshold voltage (Vth​) and predictable, reliable transistor performance.&lt;br /&gt;
* &#039;&#039;&#039;✅ Superior Noise Isolation:&#039;&#039;&#039; The guard ring isolates the transistor from substrate noise coming from other parts of the chip. This is critical for analog, RF, and mixed-signal designs. It also prevents the transistor itself from polluting the substrate with noise.&lt;br /&gt;
* &#039;&#039;&#039;✅ Low Substrate Resistance:&#039;&#039;&#039; Provides a uniform, low-impedance connection to the substrate from all sides of the device.&lt;br /&gt;
&lt;br /&gt;
==== &#039;&#039;&#039;Cons:&#039;&#039;&#039; ====&lt;br /&gt;
&lt;br /&gt;
* &#039;&#039;&#039;❌ Larger Area Consumption:&#039;&#039;&#039; This is the main drawback. The ring and the necessary spacing rules (DRC) around it consume significantly more silicon area, increasing cost.&lt;br /&gt;
* &#039;&#039;&#039;❌ More Complex Layout:&#039;&#039;&#039; Requires more effort to draw and can sometimes complicate local routing.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;When to Use:&#039;&#039;&#039; This is the industry-standard and highly recommended approach for:&lt;br /&gt;
&lt;br /&gt;
* &#039;&#039;&#039;Analog &amp;amp; Mixed-Signal Circuits:&#039;&#039;&#039; Where predictable performance, device matching, and low noise are essential.&lt;br /&gt;
* &#039;&#039;&#039;I/O (Input/Output) Cells:&#039;&#039;&#039; Where latch-up protection is a paramount safety and reliability concern.&lt;br /&gt;
* &#039;&#039;&#039;Large Transistors:&#039;&#039;&#039; Any large, multi-fingered transistor used for driving significant loads will benefit from the improved performance and reliability of a guard ring.&lt;br /&gt;
&lt;br /&gt;
== Recommendation for Your Fingered Transistor ==&lt;br /&gt;
For a multi-fingered transistor like the one you are designing for LibrePDK, &#039;&#039;&#039;the bulk contact ring is strongly recommended.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
A fingered layout is typically used to create a larger transistor for driving higher currents or for use in analog circuits. In both of these scenarios, the drawbacks of a single bulk contact (unpredictable body effect, poor latch-up immunity) become severe.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Conclusion:&#039;&#039;&#039; While a single contact saves space, it introduces performance and reliability risks that are generally not acceptable for a robust, general-purpose device in a PDK. The &#039;&#039;&#039;guard ring&#039;&#039;&#039; ensures your transistor will be reliable, perform as expected, and be safe to use in a wide variety of circuit applications, especially analog and mixed-signal designs.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Fingered_Transistors&amp;diff=577</id>
		<title>Fingered Transistors</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Fingered_Transistors&amp;diff=577"/>
		<updated>2025-10-12T16:03:34Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;Fingers involve splitting a single large transistor into multiple smaller transistors (or “fingers”) and connecting them in parallel.&lt;br /&gt;
&lt;br /&gt;
Instead of having one large transistor, the width is divided into several parts.&lt;br /&gt;
&lt;br /&gt;
Each finger shares a common gate but has separate source and drain regions.&lt;br /&gt;
&lt;br /&gt;
The Bulk/Substrate contact is a ring, also known as a guard ring. The reason making the bulk contact surround the transistor, has been nicely elaborated by Gemini&amp;lt;ref&amp;gt;[[Analysis: Single Bulk Contact vs. Bulk Contact Ring for a FET]]&amp;lt;/ref&amp;gt;.&lt;br /&gt;
&lt;br /&gt;
[[File:Layout-of-multi-finger-RF-transistors-with-variable-L-f-5-011-018-025-045-1-2.png|none|frame|Fingered transistor layout example]]&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=576</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=576"/>
		<updated>2025-10-12T16:00:40Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Transmission gate */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
[[File:Inverter.png|none|thumb|An Inverter gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;2&amp;quot; | Inverter truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|colspan=1|&#039;&#039;&#039;Input&#039;&#039;&#039; || &#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| A || NOT A&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Input Buffer/Level Shifter ==&lt;br /&gt;
The transmission gate has the purpose of making sure that the input signal is being shifted to the logic levels of the internal logic, for instance 3V3 external logic levels to 1V8 internal logic.&lt;br /&gt;
[[File:Transmission gate.png|none|thumb|Transmission Gate Schematics]]&lt;br /&gt;
In addition, it contains additional polarity, over voltage and current protection.&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
[[File:Output Driver.png|none|thumb|Driver Circuit Schematic]]&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
In the schematic above, the output transistors M7 and M8 are responsible for ultimately driving the loads attached to a pad and as such will be much larger than their driving transistors (M1=M6). M7/M8 are [[Fingered Transistors]]&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Main_Page&amp;diff=575</id>
		<title>Main Page</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Main_Page&amp;diff=575"/>
		<updated>2025-10-12T15:58:51Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;This is the knowledge DB for the [[LibreSilicon stack]]&lt;br /&gt;
&lt;br /&gt;
Please check out the [[LibreSilicon stack]] here for an overview!!&lt;br /&gt;
&lt;br /&gt;
The official website can be found here under [https://libresilicon.com/ LibreSilicon]&lt;br /&gt;
&lt;br /&gt;
The LibreSilicon knowledge DB is holding [[chemical recipes]] as well as [[software tools]] needed to build free and open source semiconductors.&lt;br /&gt;
&lt;br /&gt;
As well as the [[Danube River]] test wafer, and it&#039;s precursor the [[Pearl River]]&lt;br /&gt;
&lt;br /&gt;
The process is flexible and can be implemented with various machines from various vendors.&lt;br /&gt;
&lt;br /&gt;
There&#039;s no need to have a very specific machine from a very specific vendor, as long as you&#039;re covering the [[Basic Tooling]] you should be ready to go.&lt;br /&gt;
&lt;br /&gt;
The LibrePDK contains tools for generating everything you need in order to generate fully functional chip design based on the design rules you provide and ship the GDS2 file to the factory for manufacturing:&lt;br /&gt;
&lt;br /&gt;
* The Standard Logic Cell generator (https://pdk.libresilicon.com/)&lt;br /&gt;
* The Pad Frame Generator which assembles the [[PadCells]] generated based on the design rules and timings provided, using the [[Pad Cell Generator]]&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=574</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=574"/>
		<updated>2025-09-26T14:58:45Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Process Flowchart */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the flowchart.&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZ&amp;gt;&lt;br /&gt;
[[File:My_image_1.png|400px|test image]]&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZPreamble&amp;gt;&lt;br /&gt;
\usepackage{tikz}&lt;br /&gt;
\usetikzlibrary[shapes,arrows,positioning]&lt;br /&gt;
&amp;lt;/PGFTikZPreamble&amp;gt;&lt;br /&gt;
&lt;br /&gt;
\begin{tikzpicture}[scale=.8,every node/.style={minimum size=1cm}]&lt;br /&gt;
	% Define block styles&lt;br /&gt;
	\tikzset{&lt;br /&gt;
		startstop/.style={rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30},&lt;br /&gt;
		process/.style={rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20},&lt;br /&gt;
		arrow/.style={thick,-&amp;gt;,&amp;gt;=stealth}&lt;br /&gt;
	}&lt;br /&gt;
&lt;br /&gt;
	% Place nodes&lt;br /&gt;
	\node (start) [startstop] {\textbf{Wafer Start} (P-type Silicon Substrate)};&lt;br /&gt;
	\node (step1) [process, below=of start] {\textbf{1. Initial Alignment} (Mask: \textit{basic})};&lt;br /&gt;
	\node (step2) [process, below=of step1] {\textbf{2. Shallow Trench Isolation (STI)} (Mask: \textit{sti})};&lt;br /&gt;
	\node (step3) [process, below=of step2] {\textbf{3. N-Well Formation} (Mask: \textit{nwell})};&lt;br /&gt;
	\node (step4) [process, below=of step3] {\textbf{4. P-Well Formation} (Mask: \textit{pwell})};&lt;br /&gt;
	\node (step5) [process, below=of step4] {\textbf{5. P-Base Implant} (Mask: \textit{pbase})};&lt;br /&gt;
	\node (step6) [process, below=of step5] {\textbf{6. N-Base Implant} (Mask: \textit{nbase})};&lt;br /&gt;
	\node (step7) [process, below=of step6] {\textbf{7. Field Oxide} (Mask: \textit{fox})};&lt;br /&gt;
	\node (step8) [process, below=of step7] {\textbf{8. SONOS Flash Cell Formation} (Mask: \textit{sonos})};&lt;br /&gt;
	\node (step9) [process, below=of step8] {\textbf{9. Gate Formation} (Mask: \textit{poly})};&lt;br /&gt;
	\node (step10) [process, below=of step9] {\textbf{10. Implant Stop Layer} (Mask: \textit{implantstop})};&lt;br /&gt;
	\node (step11) [process, below=of step10] {\textbf{11. N+ Source/Drain Implant} (Mask: \textit{nimplant})};&lt;br /&gt;
	\node (step12) [process, below=of step11] {\textbf{12. P+ Source/Drain Implant} (Mask: \textit{pimplant})};&lt;br /&gt;
	\node (step13) [process, below=of step12] {\textbf{13. Silicidation} (Mask: \textit{silicideblock})};&lt;br /&gt;
	\node (step14) [process, below=of step13] {\textbf{14. Contact Layer} (Mask: \textit{contact})};&lt;br /&gt;
	\node (step15) [process, below=of step14] {\textbf{15. Metal 1 Layer} (Mask: \textit{metal1})};&lt;br /&gt;
	\node (step16) [process, below=of step15] {\textbf{16. Via 1 Layer} (Mask: \textit{via1})};&lt;br /&gt;
	\node (step17) [process, below=of step16] {\textbf{17. Metal 2 Layer} (Mask: \textit{metal2})};&lt;br /&gt;
	\node (step18) [process, below=of step17] {\textbf{18. Via 2 Layer} (Mask: \textit{via2})};&lt;br /&gt;
	\node (step19) [process, below=of step18] {\textbf{19. Metal 3 Layer} (Mask: \textit{metal3})};&lt;br /&gt;
	\node (step20) [process, below=of step19] {\textbf{20. Passivation (Glass)} (Mask: \textit{glass})};&lt;br /&gt;
	\node (end) [startstop, below=of step20] {\textbf{Process End}};&lt;br /&gt;
	&lt;br /&gt;
	% Draw arrows&lt;br /&gt;
	\draw [arrow] (start) -- (step1);&lt;br /&gt;
	\draw [arrow] (step1) -- (step2);&lt;br /&gt;
	\draw [arrow] (step2) -- (step3);&lt;br /&gt;
	\draw [arrow] (step3) -- (step4);&lt;br /&gt;
	\draw [arrow] (step4) -- (step5);&lt;br /&gt;
	\draw [arrow] (step5) -- (step6);&lt;br /&gt;
	\draw [arrow] (step6) -- (step7);&lt;br /&gt;
	\draw [arrow] (step7) -- (step8);&lt;br /&gt;
	\draw [arrow] (step8) -- (step9);&lt;br /&gt;
	\draw [arrow] (step9) -- (step10);&lt;br /&gt;
	\draw [arrow] (step10) -- (step11);&lt;br /&gt;
	\draw [arrow] (step11) -- (step12);&lt;br /&gt;
	\draw [arrow] (step12) -- (step13);&lt;br /&gt;
	\draw [arrow] (step13) -- (step14);&lt;br /&gt;
	\draw [arrow] (step14) -- (step15);&lt;br /&gt;
	\draw [arrow] (step15) -- (step16);&lt;br /&gt;
	\draw [arrow] (step16) -- (step17);&lt;br /&gt;
	\draw [arrow] (step17) -- (step18);&lt;br /&gt;
	\draw [arrow] (step18) -- (step19);&lt;br /&gt;
	\draw [arrow] (step19) -- (step20);&lt;br /&gt;
	\draw [arrow] (step20) -- (end);&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&amp;lt;/PGFTikZ&amp;gt;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=573</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=573"/>
		<updated>2025-09-26T14:48:35Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Process Flowchart */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the TikZ code for generating a graphical flowchart. &#039;&#039;(Note: Requires a MediaWiki extension capable of rendering TikZ.)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZ&amp;gt;&lt;br /&gt;
[[File:My_image_1.png|400px|test image]]&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZPreamble&amp;gt;&lt;br /&gt;
\usepackage{tikz}&lt;br /&gt;
\usetikzlibrary[shapes,arrows,positioning]&lt;br /&gt;
&amp;lt;/PGFTikZPreamble&amp;gt;&lt;br /&gt;
&lt;br /&gt;
\begin{tikzpicture}[scale=.8,every node/.style={minimum size=1cm}]&lt;br /&gt;
	% Define block styles&lt;br /&gt;
	\tikzset{&lt;br /&gt;
		startstop/.style={rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30},&lt;br /&gt;
		process/.style={rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20},&lt;br /&gt;
		arrow/.style={thick,-&amp;gt;,&amp;gt;=stealth}&lt;br /&gt;
	}&lt;br /&gt;
&lt;br /&gt;
	% Place nodes&lt;br /&gt;
	\node (start) [startstop] {\textbf{Wafer Start} (P-type Silicon Substrate)};&lt;br /&gt;
	\node (step1) [process, below=of start] {\textbf{1. Initial Alignment} (Mask: \textit{basic})};&lt;br /&gt;
	\node (step2) [process, below=of step1] {\textbf{2. Shallow Trench Isolation (STI)} (Mask: \textit{sti})};&lt;br /&gt;
	\node (step3) [process, below=of step2] {\textbf{3. N-Well Formation} (Mask: \textit{nwell})};&lt;br /&gt;
	\node (step4) [process, below=of step3] {\textbf{4. P-Well Formation} (Mask: \textit{pwell})};&lt;br /&gt;
	\node (step5) [process, below=of step4] {\textbf{5. P-Base Implant} (Mask: \textit{pbase})};&lt;br /&gt;
	\node (step6) [process, below=of step5] {\textbf{6. N-Base Implant} (Mask: \textit{nbase})};&lt;br /&gt;
	\node (step7) [process, below=of step6] {\textbf{7. Field Oxide} (Mask: \textit{fox})};&lt;br /&gt;
	\node (step8) [process, below=of step7] {\textbf{8. SONOS Flash Cell Formation} (Mask: \textit{sonos})};&lt;br /&gt;
	\node (step9) [process, below=of step8] {\textbf{9. Gate Formation} (Mask: \textit{poly})};&lt;br /&gt;
	\node (step10) [process, below=of step9] {\textbf{10. Implant Stop Layer} (Mask: \textit{implantstop})};&lt;br /&gt;
	\node (step11) [process, below=of step10] {\textbf{11. N+ Source/Drain Implant} (Mask: \textit{nimplant})};&lt;br /&gt;
	\node (step12) [process, below=of step11] {\textbf{12. P+ Source/Drain Implant} (Mask: \textit{pimplant})};&lt;br /&gt;
	\node (step13) [process, below=of step12] {\textbf{13. Silicidation} (Mask: \textit{silicideblock})};&lt;br /&gt;
	\node (step14) [process, below=of step13] {\textbf{14. Contact Layer} (Mask: \textit{contact})};&lt;br /&gt;
	\node (step15) [process, below=of step14] {\textbf{15. Metal 1 Layer} (Mask: \textit{metal1})};&lt;br /&gt;
	\node (step16) [process, below=of step15] {\textbf{16. Via 1 Layer} (Mask: \textit{via1})};&lt;br /&gt;
	\node (step17) [process, below=of step16] {\textbf{17. Metal 2 Layer} (Mask: \textit{metal2})};&lt;br /&gt;
	\node (step18) [process, below=of step17] {\textbf{18. Via 2 Layer} (Mask: \textit{via2})};&lt;br /&gt;
	\node (step19) [process, below=of step18] {\textbf{19. Metal 3 Layer} (Mask: \textit{metal3})};&lt;br /&gt;
	\node (step20) [process, below=of step19] {\textbf{20. Passivation (Glass)} (Mask: \textit{glass})};&lt;br /&gt;
	\node (end) [startstop, below=of step20] {\textbf{Process End}};&lt;br /&gt;
	&lt;br /&gt;
	% Draw arrows&lt;br /&gt;
	\draw [arrow] (start) -- (step1);&lt;br /&gt;
	\draw [arrow] (step1) -- (step2);&lt;br /&gt;
	\draw [arrow] (step2) -- (step3);&lt;br /&gt;
	\draw [arrow] (step3) -- (step4);&lt;br /&gt;
	\draw [arrow] (step4) -- (step5);&lt;br /&gt;
	\draw [arrow] (step5) -- (step6);&lt;br /&gt;
	\draw [arrow] (step6) -- (step7);&lt;br /&gt;
	\draw [arrow] (step7) -- (step8);&lt;br /&gt;
	\draw [arrow] (step8) -- (step9);&lt;br /&gt;
	\draw [arrow] (step9) -- (step10);&lt;br /&gt;
	\draw [arrow] (step10) -- (step11);&lt;br /&gt;
	\draw [arrow] (step11) -- (step12);&lt;br /&gt;
	\draw [arrow] (step12) -- (step13);&lt;br /&gt;
	\draw [arrow] (step13) -- (step14);&lt;br /&gt;
	\draw [arrow] (step14) -- (step15);&lt;br /&gt;
	\draw [arrow] (step15) -- (step16);&lt;br /&gt;
	\draw [arrow] (step16) -- (step17);&lt;br /&gt;
	\draw [arrow] (step17) -- (step18);&lt;br /&gt;
	\draw [arrow] (step18) -- (step19);&lt;br /&gt;
	\draw [arrow] (step19) -- (step20);&lt;br /&gt;
	\draw [arrow] (step20) -- (end);&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&amp;lt;/PGFTikZ&amp;gt;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=File:My_image_1.png&amp;diff=572</id>
		<title>File:My image 1.png</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=File:My_image_1.png&amp;diff=572"/>
		<updated>2025-09-26T14:48:35Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: Automatically uploaded by PGFTikZ extension&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;&amp;lt;pre&amp;gt;&lt;br /&gt;
PGFTikZ-file-text -- DO NOT EDIT&lt;br /&gt;
&lt;br /&gt;
[[File:My_image_1.png|400px|test image]]&lt;br /&gt;
&lt;br /&gt;
&amp;amp;lt;PGFTikZPreamble&amp;amp;gt;&lt;br /&gt;
\usepackage{tikz}&lt;br /&gt;
\usetikzlibrary[shapes,arrows,positioning]&lt;br /&gt;
&amp;amp;lt;/PGFTikZPreamble&amp;amp;gt;&lt;br /&gt;
&lt;br /&gt;
\begin{tikzpicture}[scale=.8,every node/.style={minimum size=1cm}]&lt;br /&gt;
	% Define block styles&lt;br /&gt;
	\tikzset{&lt;br /&gt;
		startstop/.style={rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30},&lt;br /&gt;
		process/.style={rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20},&lt;br /&gt;
		arrow/.style={thick,-&amp;amp;gt;,&amp;amp;gt;=stealth}&lt;br /&gt;
	}&lt;br /&gt;
&lt;br /&gt;
	% Place nodes&lt;br /&gt;
	\node (start) [startstop] {\textbf{Wafer Start} (P-type Silicon Substrate)};&lt;br /&gt;
	\node (step1) [process, below=of start] {\textbf{1. Initial Alignment} (Mask: \textit{basic})};&lt;br /&gt;
	\node (step2) [process, below=of step1] {\textbf{2. Shallow Trench Isolation (STI)} (Mask: \textit{sti})};&lt;br /&gt;
	\node (step3) [process, below=of step2] {\textbf{3. N-Well Formation} (Mask: \textit{nwell})};&lt;br /&gt;
	\node (step4) [process, below=of step3] {\textbf{4. P-Well Formation} (Mask: \textit{pwell})};&lt;br /&gt;
	\node (step5) [process, below=of step4] {\textbf{5. P-Base Implant} (Mask: \textit{pbase})};&lt;br /&gt;
	\node (step6) [process, below=of step5] {\textbf{6. N-Base Implant} (Mask: \textit{nbase})};&lt;br /&gt;
	\node (step7) [process, below=of step6] {\textbf{7. Field Oxide} (Mask: \textit{fox})};&lt;br /&gt;
	\node (step8) [process, below=of step7] {\textbf{8. SONOS Flash Cell Formation} (Mask: \textit{sonos})};&lt;br /&gt;
	\node (step9) [process, below=of step8] {\textbf{9. Gate Formation} (Mask: \textit{poly})};&lt;br /&gt;
	\node (step10) [process, below=of step9] {\textbf{10. Implant Stop Layer} (Mask: \textit{implantstop})};&lt;br /&gt;
	\node (step11) [process, below=of step10] {\textbf{11. N+ Source/Drain Implant} (Mask: \textit{nimplant})};&lt;br /&gt;
	\node (step12) [process, below=of step11] {\textbf{12. P+ Source/Drain Implant} (Mask: \textit{pimplant})};&lt;br /&gt;
	\node (step13) [process, below=of step12] {\textbf{13. Silicidation} (Mask: \textit{silicideblock})};&lt;br /&gt;
	\node (step14) [process, below=of step13] {\textbf{14. Contact Layer} (Mask: \textit{contact})};&lt;br /&gt;
	\node (step15) [process, below=of step14] {\textbf{15. Metal 1 Layer} (Mask: \textit{metal1})};&lt;br /&gt;
	\node (step16) [process, below=of step15] {\textbf{16. Via 1 Layer} (Mask: \textit{via1})};&lt;br /&gt;
	\node (step17) [process, below=of step16] {\textbf{17. Metal 2 Layer} (Mask: \textit{metal2})};&lt;br /&gt;
	\node (step18) [process, below=of step17] {\textbf{18. Via 2 Layer} (Mask: \textit{via2})};&lt;br /&gt;
	\node (step19) [process, below=of step18] {\textbf{19. Metal 3 Layer} (Mask: \textit{metal3})};&lt;br /&gt;
	\node (step20) [process, below=of step19] {\textbf{20. Passivation (Glass)} (Mask: \textit{glass})};&lt;br /&gt;
	\node (end) [startstop, below=of step20] {\textbf{Process End}};&lt;br /&gt;
	&lt;br /&gt;
	% Draw arrows&lt;br /&gt;
	\draw [arrow] (start) -- (step1);&lt;br /&gt;
	\draw [arrow] (step1) -- (step2);&lt;br /&gt;
	\draw [arrow] (step2) -- (step3);&lt;br /&gt;
	\draw [arrow] (step3) -- (step4);&lt;br /&gt;
	\draw [arrow] (step4) -- (step5);&lt;br /&gt;
	\draw [arrow] (step5) -- (step6);&lt;br /&gt;
	\draw [arrow] (step6) -- (step7);&lt;br /&gt;
	\draw [arrow] (step7) -- (step8);&lt;br /&gt;
	\draw [arrow] (step8) -- (step9);&lt;br /&gt;
	\draw [arrow] (step9) -- (step10);&lt;br /&gt;
	\draw [arrow] (step10) -- (step11);&lt;br /&gt;
	\draw [arrow] (step11) -- (step12);&lt;br /&gt;
	\draw [arrow] (step12) -- (step13);&lt;br /&gt;
	\draw [arrow] (step13) -- (step14);&lt;br /&gt;
	\draw [arrow] (step14) -- (step15);&lt;br /&gt;
	\draw [arrow] (step15) -- (step16);&lt;br /&gt;
	\draw [arrow] (step16) -- (step17);&lt;br /&gt;
	\draw [arrow] (step17) -- (step18);&lt;br /&gt;
	\draw [arrow] (step18) -- (step19);&lt;br /&gt;
	\draw [arrow] (step19) -- (step20);&lt;br /&gt;
	\draw [arrow] (step20) -- (end);&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&lt;br /&gt;
PGFTikZ-file-text -- DO NOT EDIT&lt;br /&gt;
&amp;lt;/pre&amp;gt;&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=571</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=571"/>
		<updated>2025-09-26T14:44:59Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Process Flowchart */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the TikZ code for generating a graphical flowchart. &#039;&#039;(Note: Requires a MediaWiki extension capable of rendering TikZ.)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZ&amp;gt;&lt;br /&gt;
[[File:My_image_1.png|400px|test image]]&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZPreamble&amp;gt;&lt;br /&gt;
\documentclass{scrartcl}&lt;br /&gt;
\usepackage{tikz}&lt;br /&gt;
\usetikzlibrary[shapes,arrows,positioning]&lt;br /&gt;
&amp;lt;/PGFTikZPreamble&amp;gt;&lt;br /&gt;
&lt;br /&gt;
\begin{tikzpicture}[scale=.8,every node/.style={minimum size=1cm}]&lt;br /&gt;
	% Define block styles&lt;br /&gt;
	\tikzset{&lt;br /&gt;
		startstop/.style={rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30},&lt;br /&gt;
		process/.style={rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20},&lt;br /&gt;
		arrow/.style={thick,-&amp;gt;,&amp;gt;=stealth}&lt;br /&gt;
	}&lt;br /&gt;
&lt;br /&gt;
	% Place nodes&lt;br /&gt;
	\node (start) [startstop] {\textbf{Wafer Start} (P-type Silicon Substrate)};&lt;br /&gt;
	\node (step1) [process, below=of start] {\textbf{1. Initial Alignment} (Mask: \textit{basic})};&lt;br /&gt;
	\node (step2) [process, below=of step1] {\textbf{2. Shallow Trench Isolation (STI)} (Mask: \textit{sti})};&lt;br /&gt;
	\node (step3) [process, below=of step2] {\textbf{3. N-Well Formation} (Mask: \textit{nwell})};&lt;br /&gt;
	\node (step4) [process, below=of step3] {\textbf{4. P-Well Formation} (Mask: \textit{pwell})};&lt;br /&gt;
	\node (step5) [process, below=of step4] {\textbf{5. P-Base Implant} (Mask: \textit{pbase})};&lt;br /&gt;
	\node (step6) [process, below=of step5] {\textbf{6. N-Base Implant} (Mask: \textit{nbase})};&lt;br /&gt;
	\node (step7) [process, below=of step6] {\textbf{7. Field Oxide} (Mask: \textit{fox})};&lt;br /&gt;
	\node (step8) [process, below=of step7] {\textbf{8. SONOS Flash Cell Formation} (Mask: \textit{sonos})};&lt;br /&gt;
	\node (step9) [process, below=of step8] {\textbf{9. Gate Formation} (Mask: \textit{poly})};&lt;br /&gt;
	\node (step10) [process, below=of step9] {\textbf{10. Implant Stop Layer} (Mask: \textit{implantstop})};&lt;br /&gt;
	\node (step11) [process, below=of step10] {\textbf{11. N+ Source/Drain Implant} (Mask: \textit{nimplant})};&lt;br /&gt;
	\node (step12) [process, below=of step11] {\textbf{12. P+ Source/Drain Implant} (Mask: \textit{pimplant})};&lt;br /&gt;
	\node (step13) [process, below=of step12] {\textbf{13. Silicidation} (Mask: \textit{silicideblock})};&lt;br /&gt;
	\node (step14) [process, below=of step13] {\textbf{14. Contact Layer} (Mask: \textit{contact})};&lt;br /&gt;
	\node (step15) [process, below=of step14] {\textbf{15. Metal 1 Layer} (Mask: \textit{metal1})};&lt;br /&gt;
	\node (step16) [process, below=of step15] {\textbf{16. Via 1 Layer} (Mask: \textit{via1})};&lt;br /&gt;
	\node (step17) [process, below=of step16] {\textbf{17. Metal 2 Layer} (Mask: \textit{metal2})};&lt;br /&gt;
	\node (step18) [process, below=of step17] {\textbf{18. Via 2 Layer} (Mask: \textit{via2})};&lt;br /&gt;
	\node (step19) [process, below=of step18] {\textbf{19. Metal 3 Layer} (Mask: \textit{metal3})};&lt;br /&gt;
	\node (step20) [process, below=of step19] {\textbf{20. Passivation (Glass)} (Mask: \textit{glass})};&lt;br /&gt;
	\node (end) [startstop, below=of step20] {\textbf{Process End}};&lt;br /&gt;
	&lt;br /&gt;
	% Draw arrows&lt;br /&gt;
	\draw [arrow] (start) -- (step1);&lt;br /&gt;
	\draw [arrow] (step1) -- (step2);&lt;br /&gt;
	\draw [arrow] (step2) -- (step3);&lt;br /&gt;
	\draw [arrow] (step3) -- (step4);&lt;br /&gt;
	\draw [arrow] (step4) -- (step5);&lt;br /&gt;
	\draw [arrow] (step5) -- (step6);&lt;br /&gt;
	\draw [arrow] (step6) -- (step7);&lt;br /&gt;
	\draw [arrow] (step7) -- (step8);&lt;br /&gt;
	\draw [arrow] (step8) -- (step9);&lt;br /&gt;
	\draw [arrow] (step9) -- (step10);&lt;br /&gt;
	\draw [arrow] (step10) -- (step11);&lt;br /&gt;
	\draw [arrow] (step11) -- (step12);&lt;br /&gt;
	\draw [arrow] (step12) -- (step13);&lt;br /&gt;
	\draw [arrow] (step13) -- (step14);&lt;br /&gt;
	\draw [arrow] (step14) -- (step15);&lt;br /&gt;
	\draw [arrow] (step15) -- (step16);&lt;br /&gt;
	\draw [arrow] (step16) -- (step17);&lt;br /&gt;
	\draw [arrow] (step17) -- (step18);&lt;br /&gt;
	\draw [arrow] (step18) -- (step19);&lt;br /&gt;
	\draw [arrow] (step19) -- (step20);&lt;br /&gt;
	\draw [arrow] (step20) -- (end);&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&amp;lt;/PGFTikZ&amp;gt;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=570</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=570"/>
		<updated>2025-09-26T14:41:22Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Process Flowchart */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the TikZ code for generating a graphical flowchart. &#039;&#039;(Note: Requires a MediaWiki extension capable of rendering TikZ.)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZ&amp;gt;&lt;br /&gt;
[[File:My_image_1.png|400px|test image]]&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZPreamble&amp;gt;&lt;br /&gt;
\usepackage{tikz}&lt;br /&gt;
\usetikzlibrary[shapes,arrows,positioning]&lt;br /&gt;
&amp;lt;/PGFTikZPreamble&amp;gt;&lt;br /&gt;
&lt;br /&gt;
\begin{tikzpicture}[scale=.8,every node/.style={minimum size=1cm}]&lt;br /&gt;
	% Define block styles&lt;br /&gt;
	\tikzset{&lt;br /&gt;
		startstop/.style={rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30},&lt;br /&gt;
		process/.style={rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20},&lt;br /&gt;
		arrow/.style={thick,-&amp;gt;,&amp;gt;=stealth}&lt;br /&gt;
	}&lt;br /&gt;
&lt;br /&gt;
	% Place nodes&lt;br /&gt;
	\node (start) [startstop] {\textbf{Wafer Start} (P-type Silicon Substrate)};&lt;br /&gt;
	\node (step1) [process, below=of start] {\textbf{1. Initial Alignment} (Mask: \textit{basic})};&lt;br /&gt;
	\node (step2) [process, below=of step1] {\textbf{2. Shallow Trench Isolation (STI)} (Mask: \textit{sti})};&lt;br /&gt;
	\node (step3) [process, below=of step2] {\textbf{3. N-Well Formation} (Mask: \textit{nwell})};&lt;br /&gt;
	\node (step4) [process, below=of step3] {\textbf{4. P-Well Formation} (Mask: \textit{pwell})};&lt;br /&gt;
	\node (step5) [process, below=of step4] {\textbf{5. P-Base Implant} (Mask: \textit{pbase})};&lt;br /&gt;
	\node (step6) [process, below=of step5] {\textbf{6. N-Base Implant} (Mask: \textit{nbase})};&lt;br /&gt;
	\node (step7) [process, below=of step6] {\textbf{7. Field Oxide} (Mask: \textit{fox})};&lt;br /&gt;
	\node (step8) [process, below=of step7] {\textbf{8. SONOS Flash Cell Formation} (Mask: \textit{sonos})};&lt;br /&gt;
	\node (step9) [process, below=of step8] {\textbf{9. Gate Formation} (Mask: \textit{poly})};&lt;br /&gt;
	\node (step10) [process, below=of step9] {\textbf{10. Implant Stop Layer} (Mask: \textit{implantstop})};&lt;br /&gt;
	\node (step11) [process, below=of step10] {\textbf{11. N+ Source/Drain Implant} (Mask: \textit{nimplant})};&lt;br /&gt;
	\node (step12) [process, below=of step11] {\textbf{12. P+ Source/Drain Implant} (Mask: \textit{pimplant})};&lt;br /&gt;
	\node (step13) [process, below=of step12] {\textbf{13. Silicidation} (Mask: \textit{silicideblock})};&lt;br /&gt;
	\node (step14) [process, below=of step13] {\textbf{14. Contact Layer} (Mask: \textit{contact})};&lt;br /&gt;
	\node (step15) [process, below=of step14] {\textbf{15. Metal 1 Layer} (Mask: \textit{metal1})};&lt;br /&gt;
	\node (step16) [process, below=of step15] {\textbf{16. Via 1 Layer} (Mask: \textit{via1})};&lt;br /&gt;
	\node (step17) [process, below=of step16] {\textbf{17. Metal 2 Layer} (Mask: \textit{metal2})};&lt;br /&gt;
	\node (step18) [process, below=of step17] {\textbf{18. Via 2 Layer} (Mask: \textit{via2})};&lt;br /&gt;
	\node (step19) [process, below=of step18] {\textbf{19. Metal 3 Layer} (Mask: \textit{metal3})};&lt;br /&gt;
	\node (step20) [process, below=of step19] {\textbf{20. Passivation (Glass)} (Mask: \textit{glass})};&lt;br /&gt;
	\node (end) [startstop, below=of step20] {\textbf{Process End}};&lt;br /&gt;
	&lt;br /&gt;
	% Draw arrows&lt;br /&gt;
	\draw [arrow] (start) -- (step1);&lt;br /&gt;
	\draw [arrow] (step1) -- (step2);&lt;br /&gt;
	\draw [arrow] (step2) -- (step3);&lt;br /&gt;
	\draw [arrow] (step3) -- (step4);&lt;br /&gt;
	\draw [arrow] (step4) -- (step5);&lt;br /&gt;
	\draw [arrow] (step5) -- (step6);&lt;br /&gt;
	\draw [arrow] (step6) -- (step7);&lt;br /&gt;
	\draw [arrow] (step7) -- (step8);&lt;br /&gt;
	\draw [arrow] (step8) -- (step9);&lt;br /&gt;
	\draw [arrow] (step9) -- (step10);&lt;br /&gt;
	\draw [arrow] (step10) -- (step11);&lt;br /&gt;
	\draw [arrow] (step11) -- (step12);&lt;br /&gt;
	\draw [arrow] (step12) -- (step13);&lt;br /&gt;
	\draw [arrow] (step13) -- (step14);&lt;br /&gt;
	\draw [arrow] (step14) -- (step15);&lt;br /&gt;
	\draw [arrow] (step15) -- (step16);&lt;br /&gt;
	\draw [arrow] (step16) -- (step17);&lt;br /&gt;
	\draw [arrow] (step17) -- (step18);&lt;br /&gt;
	\draw [arrow] (step18) -- (step19);&lt;br /&gt;
	\draw [arrow] (step19) -- (step20);&lt;br /&gt;
	\draw [arrow] (step20) -- (end);&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&amp;lt;/PGFTikZ&amp;gt;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=569</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=569"/>
		<updated>2025-09-26T14:40:45Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Process Flowchart */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the TikZ code for generating a graphical flowchart. &#039;&#039;(Note: Requires a MediaWiki extension capable of rendering TikZ.)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZ&amp;gt;&lt;br /&gt;
[[File:My_image_1.png|400px|test image]]&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZPreamble&amp;gt;&lt;br /&gt;
\usepackage{tikz}&lt;br /&gt;
\usetikzlibrary[shapes,arrows,positioning]&lt;br /&gt;
&amp;lt;/PGFTikZPreamble&amp;gt;&lt;br /&gt;
&lt;br /&gt;
\begin{tikzpicture}[node distance=0.7cm, auto]&lt;br /&gt;
	% Define block styles&lt;br /&gt;
	\tikzset{&lt;br /&gt;
		startstop/.style={rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30},&lt;br /&gt;
		process/.style={rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20},&lt;br /&gt;
		arrow/.style={thick,-&amp;gt;,&amp;gt;=stealth}&lt;br /&gt;
	}&lt;br /&gt;
&lt;br /&gt;
	% Place nodes&lt;br /&gt;
	\node (start) [startstop] {\textbf{Wafer Start} (P-type Silicon Substrate)};&lt;br /&gt;
	\node (step1) [process, below=of start] {\textbf{1. Initial Alignment} (Mask: \textit{basic})};&lt;br /&gt;
	\node (step2) [process, below=of step1] {\textbf{2. Shallow Trench Isolation (STI)} (Mask: \textit{sti})};&lt;br /&gt;
	\node (step3) [process, below=of step2] {\textbf{3. N-Well Formation} (Mask: \textit{nwell})};&lt;br /&gt;
	\node (step4) [process, below=of step3] {\textbf{4. P-Well Formation} (Mask: \textit{pwell})};&lt;br /&gt;
	\node (step5) [process, below=of step4] {\textbf{5. P-Base Implant} (Mask: \textit{pbase})};&lt;br /&gt;
	\node (step6) [process, below=of step5] {\textbf{6. N-Base Implant} (Mask: \textit{nbase})};&lt;br /&gt;
	\node (step7) [process, below=of step6] {\textbf{7. Field Oxide} (Mask: \textit{fox})};&lt;br /&gt;
	\node (step8) [process, below=of step7] {\textbf{8. SONOS Flash Cell Formation} (Mask: \textit{sonos})};&lt;br /&gt;
	\node (step9) [process, below=of step8] {\textbf{9. Gate Formation} (Mask: \textit{poly})};&lt;br /&gt;
	\node (step10) [process, below=of step9] {\textbf{10. Implant Stop Layer} (Mask: \textit{implantstop})};&lt;br /&gt;
	\node (step11) [process, below=of step10] {\textbf{11. N+ Source/Drain Implant} (Mask: \textit{nimplant})};&lt;br /&gt;
	\node (step12) [process, below=of step11] {\textbf{12. P+ Source/Drain Implant} (Mask: \textit{pimplant})};&lt;br /&gt;
	\node (step13) [process, below=of step12] {\textbf{13. Silicidation} (Mask: \textit{silicideblock})};&lt;br /&gt;
	\node (step14) [process, below=of step13] {\textbf{14. Contact Layer} (Mask: \textit{contact})};&lt;br /&gt;
	\node (step15) [process, below=of step14] {\textbf{15. Metal 1 Layer} (Mask: \textit{metal1})};&lt;br /&gt;
	\node (step16) [process, below=of step15] {\textbf{16. Via 1 Layer} (Mask: \textit{via1})};&lt;br /&gt;
	\node (step17) [process, below=of step16] {\textbf{17. Metal 2 Layer} (Mask: \textit{metal2})};&lt;br /&gt;
	\node (step18) [process, below=of step17] {\textbf{18. Via 2 Layer} (Mask: \textit{via2})};&lt;br /&gt;
	\node (step19) [process, below=of step18] {\textbf{19. Metal 3 Layer} (Mask: \textit{metal3})};&lt;br /&gt;
	\node (step20) [process, below=of step19] {\textbf{20. Passivation (Glass)} (Mask: \textit{glass})};&lt;br /&gt;
	\node (end) [startstop, below=of step20] {\textbf{Process End}};&lt;br /&gt;
	&lt;br /&gt;
	% Draw arrows&lt;br /&gt;
	\draw [arrow] (start) -- (step1);&lt;br /&gt;
	\draw [arrow] (step1) -- (step2);&lt;br /&gt;
	\draw [arrow] (step2) -- (step3);&lt;br /&gt;
	\draw [arrow] (step3) -- (step4);&lt;br /&gt;
	\draw [arrow] (step4) -- (step5);&lt;br /&gt;
	\draw [arrow] (step5) -- (step6);&lt;br /&gt;
	\draw [arrow] (step6) -- (step7);&lt;br /&gt;
	\draw [arrow] (step7) -- (step8);&lt;br /&gt;
	\draw [arrow] (step8) -- (step9);&lt;br /&gt;
	\draw [arrow] (step9) -- (step10);&lt;br /&gt;
	\draw [arrow] (step10) -- (step11);&lt;br /&gt;
	\draw [arrow] (step11) -- (step12);&lt;br /&gt;
	\draw [arrow] (step12) -- (step13);&lt;br /&gt;
	\draw [arrow] (step13) -- (step14);&lt;br /&gt;
	\draw [arrow] (step14) -- (step15);&lt;br /&gt;
	\draw [arrow] (step15) -- (step16);&lt;br /&gt;
	\draw [arrow] (step16) -- (step17);&lt;br /&gt;
	\draw [arrow] (step17) -- (step18);&lt;br /&gt;
	\draw [arrow] (step18) -- (step19);&lt;br /&gt;
	\draw [arrow] (step19) -- (step20);&lt;br /&gt;
	\draw [arrow] (step20) -- (end);&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&amp;lt;/PGFTikZ&amp;gt;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=568</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=568"/>
		<updated>2025-09-26T14:40:02Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Process Flowchart */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the TikZ code for generating a graphical flowchart. &#039;&#039;(Note: Requires a MediaWiki extension capable of rendering TikZ.)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZ&amp;gt;&lt;br /&gt;
[[File:My_image_1.png|400px|test image]]&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZPreamble&amp;gt;&lt;br /&gt;
\usepackage{tikz}&lt;br /&gt;
\usetikzlibrary[shapes,arrows,positioning]&lt;br /&gt;
&amp;lt;/PGFTikZPreamble&amp;gt;&lt;br /&gt;
&lt;br /&gt;
\begin{tikzpicture}[node distance=0.7cm, auto]&lt;br /&gt;
&lt;br /&gt;
	% Define block styles&lt;br /&gt;
	\tikzset{&lt;br /&gt;
		startstop/.style={rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30},&lt;br /&gt;
		process/.style={rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20},&lt;br /&gt;
		arrow/.style={thick,-&amp;gt;,&amp;gt;=stealth}&lt;br /&gt;
	}&lt;br /&gt;
	&lt;br /&gt;
	% Place nodes&lt;br /&gt;
	\node (start) [startstop] {\textbf{Wafer Start} (P-type Silicon Substrate)};&lt;br /&gt;
	\node (step1) [process, below=of start] {\textbf{1. Initial Alignment} (Mask: \textit{basic})};&lt;br /&gt;
	\node (step2) [process, below=of step1] {\textbf{2. Shallow Trench Isolation (STI)} (Mask: \textit{sti})};&lt;br /&gt;
	\node (step3) [process, below=of step2] {\textbf{3. N-Well Formation} (Mask: \textit{nwell})};&lt;br /&gt;
	\node (step4) [process, below=of step3] {\textbf{4. P-Well Formation} (Mask: \textit{pwell})};&lt;br /&gt;
	\node (step5) [process, below=of step4] {\textbf{5. P-Base Implant} (Mask: \textit{pbase})};&lt;br /&gt;
	\node (step6) [process, below=of step5] {\textbf{6. N-Base Implant} (Mask: \textit{nbase})};&lt;br /&gt;
	\node (step7) [process, below=of step6] {\textbf{7. Field Oxide} (Mask: \textit{fox})};&lt;br /&gt;
	\node (step8) [process, below=of step7] {\textbf{8. SONOS Flash Cell Formation} (Mask: \textit{sonos})};&lt;br /&gt;
	\node (step9) [process, below=of step8] {\textbf{9. Gate Formation} (Mask: \textit{poly})};&lt;br /&gt;
	\node (step10) [process, below=of step9] {\textbf{10. Implant Stop Layer} (Mask: \textit{implantstop})};&lt;br /&gt;
	\node (step11) [process, below=of step10] {\textbf{11. N+ Source/Drain Implant} (Mask: \textit{nimplant})};&lt;br /&gt;
	\node (step12) [process, below=of step11] {\textbf{12. P+ Source/Drain Implant} (Mask: \textit{pimplant})};&lt;br /&gt;
	\node (step13) [process, below=of step12] {\textbf{13. Silicidation} (Mask: \textit{silicideblock})};&lt;br /&gt;
	\node (step14) [process, below=of step13] {\textbf{14. Contact Layer} (Mask: \textit{contact})};&lt;br /&gt;
	\node (step15) [process, below=of step14] {\textbf{15. Metal 1 Layer} (Mask: \textit{metal1})};&lt;br /&gt;
	\node (step16) [process, below=of step15] {\textbf{16. Via 1 Layer} (Mask: \textit{via1})};&lt;br /&gt;
	\node (step17) [process, below=of step16] {\textbf{17. Metal 2 Layer} (Mask: \textit{metal2})};&lt;br /&gt;
	\node (step18) [process, below=of step17] {\textbf{18. Via 2 Layer} (Mask: \textit{via2})};&lt;br /&gt;
	\node (step19) [process, below=of step18] {\textbf{19. Metal 3 Layer} (Mask: \textit{metal3})};&lt;br /&gt;
	\node (step20) [process, below=of step19] {\textbf{20. Passivation (Glass)} (Mask: \textit{glass})};&lt;br /&gt;
	\node (end) [startstop, below=of step20] {\textbf{Process End}};&lt;br /&gt;
	&lt;br /&gt;
	% Draw arrows&lt;br /&gt;
	\draw [arrow] (start) -- (step1);&lt;br /&gt;
	\draw [arrow] (step1) -- (step2);&lt;br /&gt;
	\draw [arrow] (step2) -- (step3);&lt;br /&gt;
	\draw [arrow] (step3) -- (step4);&lt;br /&gt;
	\draw [arrow] (step4) -- (step5);&lt;br /&gt;
	\draw [arrow] (step5) -- (step6);&lt;br /&gt;
	\draw [arrow] (step6) -- (step7);&lt;br /&gt;
	\draw [arrow] (step7) -- (step8);&lt;br /&gt;
	\draw [arrow] (step8) -- (step9);&lt;br /&gt;
	\draw [arrow] (step9) -- (step10);&lt;br /&gt;
	\draw [arrow] (step10) -- (step11);&lt;br /&gt;
	\draw [arrow] (step11) -- (step12);&lt;br /&gt;
	\draw [arrow] (step12) -- (step13);&lt;br /&gt;
	\draw [arrow] (step13) -- (step14);&lt;br /&gt;
	\draw [arrow] (step14) -- (step15);&lt;br /&gt;
	\draw [arrow] (step15) -- (step16);&lt;br /&gt;
	\draw [arrow] (step16) -- (step17);&lt;br /&gt;
	\draw [arrow] (step17) -- (step18);&lt;br /&gt;
	\draw [arrow] (step18) -- (step19);&lt;br /&gt;
	\draw [arrow] (step19) -- (step20);&lt;br /&gt;
	\draw [arrow] (step20) -- (end);&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&amp;lt;/PGFTikZ&amp;gt;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=567</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=567"/>
		<updated>2025-09-26T14:39:29Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Process Flowchart */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the TikZ code for generating a graphical flowchart. &#039;&#039;(Note: Requires a MediaWiki extension capable of rendering TikZ.)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZ&amp;gt;&lt;br /&gt;
[[File:My_image_1.png|400px|test image]]&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZPreamble&amp;gt;&lt;br /&gt;
\usepackage{tikz}&lt;br /&gt;
&amp;lt;/PGFTikZPreamble&amp;gt;&lt;br /&gt;
&lt;br /&gt;
\begin{tikzpicture}[node distance=0.7cm, auto]&lt;br /&gt;
&lt;br /&gt;
	\usetikzlibrary[shapes,arrows,positioning]&lt;br /&gt;
&lt;br /&gt;
	% Define block styles&lt;br /&gt;
	\tikzset{&lt;br /&gt;
		startstop/.style={rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30},&lt;br /&gt;
		process/.style={rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20},&lt;br /&gt;
		arrow/.style={thick,-&amp;gt;,&amp;gt;=stealth}&lt;br /&gt;
	}&lt;br /&gt;
	&lt;br /&gt;
	% Place nodes&lt;br /&gt;
	\node (start) [startstop] {\textbf{Wafer Start} (P-type Silicon Substrate)};&lt;br /&gt;
	\node (step1) [process, below=of start] {\textbf{1. Initial Alignment} (Mask: \textit{basic})};&lt;br /&gt;
	\node (step2) [process, below=of step1] {\textbf{2. Shallow Trench Isolation (STI)} (Mask: \textit{sti})};&lt;br /&gt;
	\node (step3) [process, below=of step2] {\textbf{3. N-Well Formation} (Mask: \textit{nwell})};&lt;br /&gt;
	\node (step4) [process, below=of step3] {\textbf{4. P-Well Formation} (Mask: \textit{pwell})};&lt;br /&gt;
	\node (step5) [process, below=of step4] {\textbf{5. P-Base Implant} (Mask: \textit{pbase})};&lt;br /&gt;
	\node (step6) [process, below=of step5] {\textbf{6. N-Base Implant} (Mask: \textit{nbase})};&lt;br /&gt;
	\node (step7) [process, below=of step6] {\textbf{7. Field Oxide} (Mask: \textit{fox})};&lt;br /&gt;
	\node (step8) [process, below=of step7] {\textbf{8. SONOS Flash Cell Formation} (Mask: \textit{sonos})};&lt;br /&gt;
	\node (step9) [process, below=of step8] {\textbf{9. Gate Formation} (Mask: \textit{poly})};&lt;br /&gt;
	\node (step10) [process, below=of step9] {\textbf{10. Implant Stop Layer} (Mask: \textit{implantstop})};&lt;br /&gt;
	\node (step11) [process, below=of step10] {\textbf{11. N+ Source/Drain Implant} (Mask: \textit{nimplant})};&lt;br /&gt;
	\node (step12) [process, below=of step11] {\textbf{12. P+ Source/Drain Implant} (Mask: \textit{pimplant})};&lt;br /&gt;
	\node (step13) [process, below=of step12] {\textbf{13. Silicidation} (Mask: \textit{silicideblock})};&lt;br /&gt;
	\node (step14) [process, below=of step13] {\textbf{14. Contact Layer} (Mask: \textit{contact})};&lt;br /&gt;
	\node (step15) [process, below=of step14] {\textbf{15. Metal 1 Layer} (Mask: \textit{metal1})};&lt;br /&gt;
	\node (step16) [process, below=of step15] {\textbf{16. Via 1 Layer} (Mask: \textit{via1})};&lt;br /&gt;
	\node (step17) [process, below=of step16] {\textbf{17. Metal 2 Layer} (Mask: \textit{metal2})};&lt;br /&gt;
	\node (step18) [process, below=of step17] {\textbf{18. Via 2 Layer} (Mask: \textit{via2})};&lt;br /&gt;
	\node (step19) [process, below=of step18] {\textbf{19. Metal 3 Layer} (Mask: \textit{metal3})};&lt;br /&gt;
	\node (step20) [process, below=of step19] {\textbf{20. Passivation (Glass)} (Mask: \textit{glass})};&lt;br /&gt;
	\node (end) [startstop, below=of step20] {\textbf{Process End}};&lt;br /&gt;
	&lt;br /&gt;
	% Draw arrows&lt;br /&gt;
	\draw [arrow] (start) -- (step1);&lt;br /&gt;
	\draw [arrow] (step1) -- (step2);&lt;br /&gt;
	\draw [arrow] (step2) -- (step3);&lt;br /&gt;
	\draw [arrow] (step3) -- (step4);&lt;br /&gt;
	\draw [arrow] (step4) -- (step5);&lt;br /&gt;
	\draw [arrow] (step5) -- (step6);&lt;br /&gt;
	\draw [arrow] (step6) -- (step7);&lt;br /&gt;
	\draw [arrow] (step7) -- (step8);&lt;br /&gt;
	\draw [arrow] (step8) -- (step9);&lt;br /&gt;
	\draw [arrow] (step9) -- (step10);&lt;br /&gt;
	\draw [arrow] (step10) -- (step11);&lt;br /&gt;
	\draw [arrow] (step11) -- (step12);&lt;br /&gt;
	\draw [arrow] (step12) -- (step13);&lt;br /&gt;
	\draw [arrow] (step13) -- (step14);&lt;br /&gt;
	\draw [arrow] (step14) -- (step15);&lt;br /&gt;
	\draw [arrow] (step15) -- (step16);&lt;br /&gt;
	\draw [arrow] (step16) -- (step17);&lt;br /&gt;
	\draw [arrow] (step17) -- (step18);&lt;br /&gt;
	\draw [arrow] (step18) -- (step19);&lt;br /&gt;
	\draw [arrow] (step19) -- (step20);&lt;br /&gt;
	\draw [arrow] (step20) -- (end);&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&amp;lt;/PGFTikZ&amp;gt;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=566</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=566"/>
		<updated>2025-09-26T14:38:59Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Process Flowchart */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the TikZ code for generating a graphical flowchart. &#039;&#039;(Note: Requires a MediaWiki extension capable of rendering TikZ.)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZ&amp;gt;&lt;br /&gt;
[[File:My_image_1.png|400px|test image]]&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZPreamble&amp;gt;&lt;br /&gt;
\usepackage{tikz}&lt;br /&gt;
\usetikzlibrary{arrows}&lt;br /&gt;
\usetikzlibrary{intersections}&lt;br /&gt;
\usetikzlibrary{calc}&lt;br /&gt;
&amp;lt;/PGFTikZPreamble&amp;gt;&lt;br /&gt;
&lt;br /&gt;
\begin{tikzpicture}[node distance=0.7cm, auto]&lt;br /&gt;
	\usetikzlibrary[shapes,arrows,positioning]&lt;br /&gt;
&lt;br /&gt;
	% Define block styles&lt;br /&gt;
	\tikzset{&lt;br /&gt;
		startstop/.style={rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30},&lt;br /&gt;
		process/.style={rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20},&lt;br /&gt;
		arrow/.style={thick,-&amp;gt;,&amp;gt;=stealth}&lt;br /&gt;
	}&lt;br /&gt;
	&lt;br /&gt;
	% Place nodes&lt;br /&gt;
	\node (start) [startstop] {\textbf{Wafer Start} (P-type Silicon Substrate)};&lt;br /&gt;
	\node (step1) [process, below=of start] {\textbf{1. Initial Alignment} (Mask: \textit{basic})};&lt;br /&gt;
	\node (step2) [process, below=of step1] {\textbf{2. Shallow Trench Isolation (STI)} (Mask: \textit{sti})};&lt;br /&gt;
	\node (step3) [process, below=of step2] {\textbf{3. N-Well Formation} (Mask: \textit{nwell})};&lt;br /&gt;
	\node (step4) [process, below=of step3] {\textbf{4. P-Well Formation} (Mask: \textit{pwell})};&lt;br /&gt;
	\node (step5) [process, below=of step4] {\textbf{5. P-Base Implant} (Mask: \textit{pbase})};&lt;br /&gt;
	\node (step6) [process, below=of step5] {\textbf{6. N-Base Implant} (Mask: \textit{nbase})};&lt;br /&gt;
	\node (step7) [process, below=of step6] {\textbf{7. Field Oxide} (Mask: \textit{fox})};&lt;br /&gt;
	\node (step8) [process, below=of step7] {\textbf{8. SONOS Flash Cell Formation} (Mask: \textit{sonos})};&lt;br /&gt;
	\node (step9) [process, below=of step8] {\textbf{9. Gate Formation} (Mask: \textit{poly})};&lt;br /&gt;
	\node (step10) [process, below=of step9] {\textbf{10. Implant Stop Layer} (Mask: \textit{implantstop})};&lt;br /&gt;
	\node (step11) [process, below=of step10] {\textbf{11. N+ Source/Drain Implant} (Mask: \textit{nimplant})};&lt;br /&gt;
	\node (step12) [process, below=of step11] {\textbf{12. P+ Source/Drain Implant} (Mask: \textit{pimplant})};&lt;br /&gt;
	\node (step13) [process, below=of step12] {\textbf{13. Silicidation} (Mask: \textit{silicideblock})};&lt;br /&gt;
	\node (step14) [process, below=of step13] {\textbf{14. Contact Layer} (Mask: \textit{contact})};&lt;br /&gt;
	\node (step15) [process, below=of step14] {\textbf{15. Metal 1 Layer} (Mask: \textit{metal1})};&lt;br /&gt;
	\node (step16) [process, below=of step15] {\textbf{16. Via 1 Layer} (Mask: \textit{via1})};&lt;br /&gt;
	\node (step17) [process, below=of step16] {\textbf{17. Metal 2 Layer} (Mask: \textit{metal2})};&lt;br /&gt;
	\node (step18) [process, below=of step17] {\textbf{18. Via 2 Layer} (Mask: \textit{via2})};&lt;br /&gt;
	\node (step19) [process, below=of step18] {\textbf{19. Metal 3 Layer} (Mask: \textit{metal3})};&lt;br /&gt;
	\node (step20) [process, below=of step19] {\textbf{20. Passivation (Glass)} (Mask: \textit{glass})};&lt;br /&gt;
	\node (end) [startstop, below=of step20] {\textbf{Process End}};&lt;br /&gt;
	&lt;br /&gt;
	% Draw arrows&lt;br /&gt;
	\draw [arrow] (start) -- (step1);&lt;br /&gt;
	\draw [arrow] (step1) -- (step2);&lt;br /&gt;
	\draw [arrow] (step2) -- (step3);&lt;br /&gt;
	\draw [arrow] (step3) -- (step4);&lt;br /&gt;
	\draw [arrow] (step4) -- (step5);&lt;br /&gt;
	\draw [arrow] (step5) -- (step6);&lt;br /&gt;
	\draw [arrow] (step6) -- (step7);&lt;br /&gt;
	\draw [arrow] (step7) -- (step8);&lt;br /&gt;
	\draw [arrow] (step8) -- (step9);&lt;br /&gt;
	\draw [arrow] (step9) -- (step10);&lt;br /&gt;
	\draw [arrow] (step10) -- (step11);&lt;br /&gt;
	\draw [arrow] (step11) -- (step12);&lt;br /&gt;
	\draw [arrow] (step12) -- (step13);&lt;br /&gt;
	\draw [arrow] (step13) -- (step14);&lt;br /&gt;
	\draw [arrow] (step14) -- (step15);&lt;br /&gt;
	\draw [arrow] (step15) -- (step16);&lt;br /&gt;
	\draw [arrow] (step16) -- (step17);&lt;br /&gt;
	\draw [arrow] (step17) -- (step18);&lt;br /&gt;
	\draw [arrow] (step18) -- (step19);&lt;br /&gt;
	\draw [arrow] (step19) -- (step20);&lt;br /&gt;
	\draw [arrow] (step20) -- (end);&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&amp;lt;/PGFTikZ&amp;gt;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=565</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=565"/>
		<updated>2025-09-26T13:51:02Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Process Flowchart */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the TikZ code for generating a graphical flowchart. &#039;&#039;(Note: Requires a MediaWiki extension capable of rendering TikZ.)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZ&amp;gt;&lt;br /&gt;
[[File:My_image_1.png|400px|test image]]&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZPreamble&amp;gt;&lt;br /&gt;
\usepackage{tikz}&lt;br /&gt;
\usetikzlibrary{arrows}&lt;br /&gt;
\usetikzlibrary{intersections}&lt;br /&gt;
\usetikzlibrary{calc}&lt;br /&gt;
&amp;lt;/PGFTikZPreamble&amp;gt;&lt;br /&gt;
&lt;br /&gt;
\begin{tikzpicture}[node distance=0.7cm, auto]&lt;br /&gt;
% Define block styles&lt;br /&gt;
\tikzstyle{startstop} = [rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30]&lt;br /&gt;
\tikzstyle{process} = [rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20]&lt;br /&gt;
\tikzstyle{arrow} = [thick,-&amp;gt;,&amp;gt;=stealth]&lt;br /&gt;
&lt;br /&gt;
% Place nodes&lt;br /&gt;
\node (start) [startstop] {&#039;&#039;&#039;Wafer Start&#039;&#039;&#039; (P-type Silicon Substrate)};&lt;br /&gt;
\node (step1) [process, below=of start] {&#039;&#039;&#039;1. Initial Alignment&#039;&#039;&#039; (Mask: &#039;&#039;basic&#039;&#039;)};&lt;br /&gt;
\node (step2) [process, below=of step1] {&#039;&#039;&#039;2. Shallow Trench Isolation (STI)&#039;&#039;&#039; (Mask: &#039;&#039;sti&#039;&#039;)};&lt;br /&gt;
\node (step3) [process, below=of step2] {&#039;&#039;&#039;3. N-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;nwell&#039;&#039;)};&lt;br /&gt;
\node (step4) [process, below=of step3] {&#039;&#039;&#039;4. P-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;pwell&#039;&#039;)};&lt;br /&gt;
\node (step5) [process, below=of step4] {&#039;&#039;&#039;5. P-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;pbase&#039;&#039;)};&lt;br /&gt;
\node (step6) [process, below=of step5] {&#039;&#039;&#039;6. N-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;nbase&#039;&#039;)};&lt;br /&gt;
\node (step7) [process, below=of step6] {&#039;&#039;&#039;7. Field Oxide&#039;&#039;&#039; (Mask: &#039;&#039;fox&#039;&#039;)};&lt;br /&gt;
\node (step8) [process, below=of step7] {&#039;&#039;&#039;8. SONOS Flash Cell Formation&#039;&#039;&#039; (Mask: &#039;&#039;sonos&#039;&#039;)};&lt;br /&gt;
\node (step9) [process, below=of step8] {&#039;&#039;&#039;9. Gate Formation&#039;&#039;&#039; (Mask: &#039;&#039;poly&#039;&#039;)};&lt;br /&gt;
\node (step10) [process, below=of step9] {&#039;&#039;&#039;10. Implant Stop Layer&#039;&#039;&#039; (Mask: &#039;&#039;implantstop&#039;&#039;)};&lt;br /&gt;
\node (step11) [process, below=of step10] {&#039;&#039;&#039;11. N+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;nimplant&#039;&#039;)};&lt;br /&gt;
\node (step12) [process, below=of step11] {&#039;&#039;&#039;12. P+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;pimplant&#039;&#039;)};&lt;br /&gt;
\node (step13) [process, below=of step12] {&#039;&#039;&#039;13. Silicidation&#039;&#039;&#039; (Mask: &#039;&#039;silicideblock&#039;&#039;)};&lt;br /&gt;
\node (step14) [process, below=of step13] {&#039;&#039;&#039;14. Contact Layer&#039;&#039;&#039; (Mask: &#039;&#039;contact&#039;&#039;)};&lt;br /&gt;
\node (step15) [process, below=of step14] {&#039;&#039;&#039;15. Metal 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal1&#039;&#039;)};&lt;br /&gt;
\node (step16) [process, below=of step15] {&#039;&#039;&#039;16. Via 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via1&#039;&#039;)};&lt;br /&gt;
\node (step17) [process, below=of step16] {&#039;&#039;&#039;17. Metal 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal2&#039;&#039;)};&lt;br /&gt;
\node (step18) [process, below=of step17] {&#039;&#039;&#039;18. Via 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via2&#039;&#039;)};&lt;br /&gt;
\node (step19) [process, below=of step18] {&#039;&#039;&#039;19. Metal 3 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal3&#039;&#039;)};&lt;br /&gt;
\node (step20) [process, below=of step19] {&#039;&#039;&#039;20. Passivation (Glass)&#039;&#039;&#039; (Mask: &#039;&#039;glass&#039;&#039;)};&lt;br /&gt;
\node (end) [startstop, below=of step20] {&#039;&#039;&#039;Process End&#039;&#039;&#039;};&lt;br /&gt;
&lt;br /&gt;
% Draw arrows&lt;br /&gt;
\draw [arrow] (start) -- (step1);&lt;br /&gt;
\draw [arrow] (step1) -- (step2);&lt;br /&gt;
\draw [arrow] (step2) -- (step3);&lt;br /&gt;
\draw [arrow] (step3) -- (step4);&lt;br /&gt;
\draw [arrow] (step4) -- (step5);&lt;br /&gt;
\draw [arrow] (step5) -- (step6);&lt;br /&gt;
\draw [arrow] (step6) -- (step7);&lt;br /&gt;
\draw [arrow] (step7) -- (step8);&lt;br /&gt;
\draw [arrow] (step8) -- (step9);&lt;br /&gt;
\draw [arrow] (step9) -- (step10);&lt;br /&gt;
\draw [arrow] (step10) -- (step11);&lt;br /&gt;
\draw [arrow] (step11) -- (step12);&lt;br /&gt;
\draw [arrow] (step12) -- (step13);&lt;br /&gt;
\draw [arrow] (step13) -- (step14);&lt;br /&gt;
\draw [arrow] (step14) -- (step15);&lt;br /&gt;
\draw [arrow] (step15) -- (step16);&lt;br /&gt;
\draw [arrow] (step16) -- (step17);&lt;br /&gt;
\draw [arrow] (step17) -- (step18);&lt;br /&gt;
\draw [arrow] (step18) -- (step19);&lt;br /&gt;
\draw [arrow] (step19) -- (step20);&lt;br /&gt;
\draw [arrow] (step20) -- (end);&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&amp;lt;/PGFTikZ&amp;gt;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=564</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=564"/>
		<updated>2025-09-26T13:31:33Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Process Flowchart */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the TikZ code for generating a graphical flowchart. &#039;&#039;(Note: Requires a MediaWiki extension capable of rendering TikZ.)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZ&amp;gt;&lt;br /&gt;
[[File:My_image_1.png|400px|test image]]&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZPreamble&amp;gt;&lt;br /&gt;
\usepackage{tikz}&lt;br /&gt;
\usetikzlibrary{arrows}&lt;br /&gt;
\usetikzlibrary{intersections}&lt;br /&gt;
\usetikzlibrary{calc}&lt;br /&gt;
&amp;lt;/PGFTikZPreamble&amp;gt;&lt;br /&gt;
&lt;br /&gt;
\begin{tikzpicture}[node distance=0.7cm, auto]&lt;br /&gt;
% Define block styles&lt;br /&gt;
\tikzstyle{startstop} = [rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30]&lt;br /&gt;
\tikzstyle{process} = [rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20]&lt;br /&gt;
\tikzstyle{arrow} = [thick,-&amp;gt;,&amp;gt;=stealth]&lt;br /&gt;
&lt;br /&gt;
% Place nodes&lt;br /&gt;
\node (start) [startstop] {&#039;&#039;&#039;Wafer Start&#039;&#039;&#039; (P-type Silicon Substrate)};&lt;br /&gt;
\node (step1) [process, below=of start] {&#039;&#039;&#039;1. Initial Alignment&#039;&#039;&#039; (Mask: &#039;&#039;basic&#039;&#039;)};&lt;br /&gt;
\node (step2) [process, below=of step1] {&#039;&#039;&#039;2. Shallow Trench Isolation (STI)&#039;&#039;&#039; (Mask: &#039;&#039;sti&#039;&#039;)};&lt;br /&gt;
\node (step3) [process, below=of step2] {&#039;&#039;&#039;3. N-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;nwell&#039;&#039;)};&lt;br /&gt;
\node (step4) [process, below=of step3] {&#039;&#039;&#039;4. P-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;pwell&#039;&#039;)};&lt;br /&gt;
\node (step5) [process, below=of step4] {&#039;&#039;&#039;5. P-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;pbase&#039;&#039;)};&lt;br /&gt;
\node (step6) [process, below=of step5] {&#039;&#039;&#039;6. N-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;nbase&#039;&#039;)};&lt;br /&gt;
\node (step7) [process, below=of step6] {&#039;&#039;&#039;7. Field Oxide&#039;&#039;&#039; (Mask: &#039;&#039;fox&#039;&#039;)};&lt;br /&gt;
\node (step8) [process, below=of step7] {&#039;&#039;&#039;8. SONOS Flash Cell Formation&#039;&#039;&#039; (Mask: &#039;&#039;sonos&#039;&#039;)};&lt;br /&gt;
\node (step9) [process, below=of step8] {&#039;&#039;&#039;9. Gate Formation&#039;&#039;&#039; (Mask: &#039;&#039;poly&#039;&#039;)};&lt;br /&gt;
\node (step10) [process, below=of step9] {&#039;&#039;&#039;10. Implant Stop Layer&#039;&#039;&#039; (Mask: &#039;&#039;implantstop&#039;&#039;)};&lt;br /&gt;
\node (step11) [process, below=of step10] {&#039;&#039;&#039;11. N+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;nimplant&#039;&#039;)};&lt;br /&gt;
\node (step12) [process, below=of step11] {&#039;&#039;&#039;12. P+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;pimplant&#039;&#039;)};&lt;br /&gt;
\node (step13) [process, below=of step12] {&#039;&#039;&#039;13. Silicidation&#039;&#039;&#039; (Mask: &#039;&#039;silicideblock&#039;&#039;)};&lt;br /&gt;
\node (step14) [process, below=of step13] {&#039;&#039;&#039;14. Contact Layer&#039;&#039;&#039; (Mask: &#039;&#039;contact&#039;&#039;)};&lt;br /&gt;
\node (step15) [process, below=of step14] {&#039;&#039;&#039;15. Metal 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal1&#039;&#039;)};&lt;br /&gt;
\node (step16) [process, below=of step15] {&#039;&#039;&#039;16. Via 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via1&#039;&#039;)};&lt;br /&gt;
\node (step17) [process, below=of step16] {&#039;&#039;&#039;17. Metal 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal2&#039;&#039;)};&lt;br /&gt;
\node (step18) [process, below=of step17] {&#039;&#039;&#039;18. Via 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via2&#039;&#039;)};&lt;br /&gt;
\node (step19) [process, below=of step18] {&#039;&#039;&#039;19. Metal 3 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal3&#039;&#039;)};&lt;br /&gt;
\node (step20) [process, below=of step19] {&#039;&#039;&#039;20. Passivation (Glass)&#039;&#039;&#039; (Mask: &#039;&#039;glass&#039;&#039;)};&lt;br /&gt;
\node (end) [startstop, below=of step20] {&#039;&#039;&#039;Process End&#039;&#039;&#039;};&lt;br /&gt;
&lt;br /&gt;
% Draw arrows&lt;br /&gt;
\draw [arrow] (start) -- (step1);&lt;br /&gt;
\draw [arrow] (step1) -- (step2);&lt;br /&gt;
\draw [arrow] (step2) -- (step3);&lt;br /&gt;
\draw [arrow] (step3) -- (step4);&lt;br /&gt;
\draw [arrow] (step4) -- (step5);&lt;br /&gt;
\draw [arrow] (step5) -- (step6);&lt;br /&gt;
\draw [arrow] (step6) -- (step7);&lt;br /&gt;
\draw [arrow] (step7) -- (step8);&lt;br /&gt;
\draw [arrow] (step8) -- (step9);&lt;br /&gt;
\draw [arrow] (step9) -- (step10);&lt;br /&gt;
\draw [arrow] (step10) -- (step11);&lt;br /&gt;
\draw [arrow] (step11) -- (step12);&lt;br /&gt;
\draw [arrow] (step12) -- (step13);&lt;br /&gt;
\draw [arrow] (step13) -- (step14);&lt;br /&gt;
\draw [arrow] (step14) -- (step15);&lt;br /&gt;
\draw [arrow] (step15) -- (step16);&lt;br /&gt;
\draw [arrow] (step16) -- (step17);&lt;br /&gt;
\draw [arrow] (step17) -- (step18);&lt;br /&gt;
\draw [arrow] (step18) -- (step19);&lt;br /&gt;
\draw [arrow] (step19) -- (step20);&lt;br /&gt;
\draw [arrow] (step20) -- (end);&lt;br /&gt;
&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&amp;lt;/PGFTikZ&amp;gt;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=563</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=563"/>
		<updated>2025-09-26T13:31:00Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Process Flowchart */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the TikZ code for generating a graphical flowchart. &#039;&#039;(Note: Requires a MediaWiki extension capable of rendering TikZ.)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZ&amp;gt;&lt;br /&gt;
[[File:My_image_1.png|400px|test image]]&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZPreamble&amp;gt;&lt;br /&gt;
\usepackage{tikz}&lt;br /&gt;
\usetikzlibrary{arrows}&lt;br /&gt;
\usetikzlibrary{intersections}&lt;br /&gt;
\usetikzlibrary{calc}&lt;br /&gt;
&lt;br /&gt;
\begin{tikzpicture}[node distance=0.7cm, auto]&lt;br /&gt;
% Define block styles&lt;br /&gt;
\tikzstyle{startstop} = [rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30]&lt;br /&gt;
\tikzstyle{process} = [rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20]&lt;br /&gt;
\tikzstyle{arrow} = [thick,-&amp;gt;,&amp;gt;=stealth]&lt;br /&gt;
&lt;br /&gt;
% Place nodes&lt;br /&gt;
\node (start) [startstop] {&#039;&#039;&#039;Wafer Start&#039;&#039;&#039; (P-type Silicon Substrate)};&lt;br /&gt;
\node (step1) [process, below=of start] {&#039;&#039;&#039;1. Initial Alignment&#039;&#039;&#039; (Mask: &#039;&#039;basic&#039;&#039;)};&lt;br /&gt;
\node (step2) [process, below=of step1] {&#039;&#039;&#039;2. Shallow Trench Isolation (STI)&#039;&#039;&#039; (Mask: &#039;&#039;sti&#039;&#039;)};&lt;br /&gt;
\node (step3) [process, below=of step2] {&#039;&#039;&#039;3. N-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;nwell&#039;&#039;)};&lt;br /&gt;
\node (step4) [process, below=of step3] {&#039;&#039;&#039;4. P-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;pwell&#039;&#039;)};&lt;br /&gt;
\node (step5) [process, below=of step4] {&#039;&#039;&#039;5. P-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;pbase&#039;&#039;)};&lt;br /&gt;
\node (step6) [process, below=of step5] {&#039;&#039;&#039;6. N-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;nbase&#039;&#039;)};&lt;br /&gt;
\node (step7) [process, below=of step6] {&#039;&#039;&#039;7. Field Oxide&#039;&#039;&#039; (Mask: &#039;&#039;fox&#039;&#039;)};&lt;br /&gt;
\node (step8) [process, below=of step7] {&#039;&#039;&#039;8. SONOS Flash Cell Formation&#039;&#039;&#039; (Mask: &#039;&#039;sonos&#039;&#039;)};&lt;br /&gt;
\node (step9) [process, below=of step8] {&#039;&#039;&#039;9. Gate Formation&#039;&#039;&#039; (Mask: &#039;&#039;poly&#039;&#039;)};&lt;br /&gt;
\node (step10) [process, below=of step9] {&#039;&#039;&#039;10. Implant Stop Layer&#039;&#039;&#039; (Mask: &#039;&#039;implantstop&#039;&#039;)};&lt;br /&gt;
\node (step11) [process, below=of step10] {&#039;&#039;&#039;11. N+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;nimplant&#039;&#039;)};&lt;br /&gt;
\node (step12) [process, below=of step11] {&#039;&#039;&#039;12. P+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;pimplant&#039;&#039;)};&lt;br /&gt;
\node (step13) [process, below=of step12] {&#039;&#039;&#039;13. Silicidation&#039;&#039;&#039; (Mask: &#039;&#039;silicideblock&#039;&#039;)};&lt;br /&gt;
\node (step14) [process, below=of step13] {&#039;&#039;&#039;14. Contact Layer&#039;&#039;&#039; (Mask: &#039;&#039;contact&#039;&#039;)};&lt;br /&gt;
\node (step15) [process, below=of step14] {&#039;&#039;&#039;15. Metal 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal1&#039;&#039;)};&lt;br /&gt;
\node (step16) [process, below=of step15] {&#039;&#039;&#039;16. Via 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via1&#039;&#039;)};&lt;br /&gt;
\node (step17) [process, below=of step16] {&#039;&#039;&#039;17. Metal 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal2&#039;&#039;)};&lt;br /&gt;
\node (step18) [process, below=of step17] {&#039;&#039;&#039;18. Via 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via2&#039;&#039;)};&lt;br /&gt;
\node (step19) [process, below=of step18] {&#039;&#039;&#039;19. Metal 3 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal3&#039;&#039;)};&lt;br /&gt;
\node (step20) [process, below=of step19] {&#039;&#039;&#039;20. Passivation (Glass)&#039;&#039;&#039; (Mask: &#039;&#039;glass&#039;&#039;)};&lt;br /&gt;
\node (end) [startstop, below=of step20] {&#039;&#039;&#039;Process End&#039;&#039;&#039;};&lt;br /&gt;
&lt;br /&gt;
% Draw arrows&lt;br /&gt;
\draw [arrow] (start) -- (step1);&lt;br /&gt;
\draw [arrow] (step1) -- (step2);&lt;br /&gt;
\draw [arrow] (step2) -- (step3);&lt;br /&gt;
\draw [arrow] (step3) -- (step4);&lt;br /&gt;
\draw [arrow] (step4) -- (step5);&lt;br /&gt;
\draw [arrow] (step5) -- (step6);&lt;br /&gt;
\draw [arrow] (step6) -- (step7);&lt;br /&gt;
\draw [arrow] (step7) -- (step8);&lt;br /&gt;
\draw [arrow] (step8) -- (step9);&lt;br /&gt;
\draw [arrow] (step9) -- (step10);&lt;br /&gt;
\draw [arrow] (step10) -- (step11);&lt;br /&gt;
\draw [arrow] (step11) -- (step12);&lt;br /&gt;
\draw [arrow] (step12) -- (step13);&lt;br /&gt;
\draw [arrow] (step13) -- (step14);&lt;br /&gt;
\draw [arrow] (step14) -- (step15);&lt;br /&gt;
\draw [arrow] (step15) -- (step16);&lt;br /&gt;
\draw [arrow] (step16) -- (step17);&lt;br /&gt;
\draw [arrow] (step17) -- (step18);&lt;br /&gt;
\draw [arrow] (step18) -- (step19);&lt;br /&gt;
\draw [arrow] (step19) -- (step20);&lt;br /&gt;
\draw [arrow] (step20) -- (end);&lt;br /&gt;
&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&amp;lt;/PGFTikZ&amp;gt;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=562</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=562"/>
		<updated>2025-09-26T13:27:58Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Process Flowchart */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the TikZ code for generating a graphical flowchart. &#039;&#039;(Note: Requires a MediaWiki extension capable of rendering TikZ.)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZ&amp;gt;&lt;br /&gt;
[[File:My_image_1.png|400px|test image]]&lt;br /&gt;
&lt;br /&gt;
&amp;lt;PGFTikZPreamble&amp;gt;&lt;br /&gt;
\begin{tikzpicture}[node distance=0.7cm, auto]&lt;br /&gt;
% Define block styles&lt;br /&gt;
\tikzstyle{startstop} = [rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30]&lt;br /&gt;
\tikzstyle{process} = [rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20]&lt;br /&gt;
\tikzstyle{arrow} = [thick,-&amp;gt;,&amp;gt;=stealth]&lt;br /&gt;
&lt;br /&gt;
% Place nodes&lt;br /&gt;
\node (start) [startstop] {&#039;&#039;&#039;Wafer Start&#039;&#039;&#039; (P-type Silicon Substrate)};&lt;br /&gt;
\node (step1) [process, below=of start] {&#039;&#039;&#039;1. Initial Alignment&#039;&#039;&#039; (Mask: &#039;&#039;basic&#039;&#039;)};&lt;br /&gt;
\node (step2) [process, below=of step1] {&#039;&#039;&#039;2. Shallow Trench Isolation (STI)&#039;&#039;&#039; (Mask: &#039;&#039;sti&#039;&#039;)};&lt;br /&gt;
\node (step3) [process, below=of step2] {&#039;&#039;&#039;3. N-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;nwell&#039;&#039;)};&lt;br /&gt;
\node (step4) [process, below=of step3] {&#039;&#039;&#039;4. P-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;pwell&#039;&#039;)};&lt;br /&gt;
\node (step5) [process, below=of step4] {&#039;&#039;&#039;5. P-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;pbase&#039;&#039;)};&lt;br /&gt;
\node (step6) [process, below=of step5] {&#039;&#039;&#039;6. N-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;nbase&#039;&#039;)};&lt;br /&gt;
\node (step7) [process, below=of step6] {&#039;&#039;&#039;7. Field Oxide&#039;&#039;&#039; (Mask: &#039;&#039;fox&#039;&#039;)};&lt;br /&gt;
\node (step8) [process, below=of step7] {&#039;&#039;&#039;8. SONOS Flash Cell Formation&#039;&#039;&#039; (Mask: &#039;&#039;sonos&#039;&#039;)};&lt;br /&gt;
\node (step9) [process, below=of step8] {&#039;&#039;&#039;9. Gate Formation&#039;&#039;&#039; (Mask: &#039;&#039;poly&#039;&#039;)};&lt;br /&gt;
\node (step10) [process, below=of step9] {&#039;&#039;&#039;10. Implant Stop Layer&#039;&#039;&#039; (Mask: &#039;&#039;implantstop&#039;&#039;)};&lt;br /&gt;
\node (step11) [process, below=of step10] {&#039;&#039;&#039;11. N+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;nimplant&#039;&#039;)};&lt;br /&gt;
\node (step12) [process, below=of step11] {&#039;&#039;&#039;12. P+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;pimplant&#039;&#039;)};&lt;br /&gt;
\node (step13) [process, below=of step12] {&#039;&#039;&#039;13. Silicidation&#039;&#039;&#039; (Mask: &#039;&#039;silicideblock&#039;&#039;)};&lt;br /&gt;
\node (step14) [process, below=of step13] {&#039;&#039;&#039;14. Contact Layer&#039;&#039;&#039; (Mask: &#039;&#039;contact&#039;&#039;)};&lt;br /&gt;
\node (step15) [process, below=of step14] {&#039;&#039;&#039;15. Metal 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal1&#039;&#039;)};&lt;br /&gt;
\node (step16) [process, below=of step15] {&#039;&#039;&#039;16. Via 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via1&#039;&#039;)};&lt;br /&gt;
\node (step17) [process, below=of step16] {&#039;&#039;&#039;17. Metal 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal2&#039;&#039;)};&lt;br /&gt;
\node (step18) [process, below=of step17] {&#039;&#039;&#039;18. Via 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via2&#039;&#039;)};&lt;br /&gt;
\node (step19) [process, below=of step18] {&#039;&#039;&#039;19. Metal 3 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal3&#039;&#039;)};&lt;br /&gt;
\node (step20) [process, below=of step19] {&#039;&#039;&#039;20. Passivation (Glass)&#039;&#039;&#039; (Mask: &#039;&#039;glass&#039;&#039;)};&lt;br /&gt;
\node (end) [startstop, below=of step20] {&#039;&#039;&#039;Process End&#039;&#039;&#039;};&lt;br /&gt;
&lt;br /&gt;
% Draw arrows&lt;br /&gt;
\draw [arrow] (start) -- (step1);&lt;br /&gt;
\draw [arrow] (step1) -- (step2);&lt;br /&gt;
\draw [arrow] (step2) -- (step3);&lt;br /&gt;
\draw [arrow] (step3) -- (step4);&lt;br /&gt;
\draw [arrow] (step4) -- (step5);&lt;br /&gt;
\draw [arrow] (step5) -- (step6);&lt;br /&gt;
\draw [arrow] (step6) -- (step7);&lt;br /&gt;
\draw [arrow] (step7) -- (step8);&lt;br /&gt;
\draw [arrow] (step8) -- (step9);&lt;br /&gt;
\draw [arrow] (step9) -- (step10);&lt;br /&gt;
\draw [arrow] (step10) -- (step11);&lt;br /&gt;
\draw [arrow] (step11) -- (step12);&lt;br /&gt;
\draw [arrow] (step12) -- (step13);&lt;br /&gt;
\draw [arrow] (step13) -- (step14);&lt;br /&gt;
\draw [arrow] (step14) -- (step15);&lt;br /&gt;
\draw [arrow] (step15) -- (step16);&lt;br /&gt;
\draw [arrow] (step16) -- (step17);&lt;br /&gt;
\draw [arrow] (step17) -- (step18);&lt;br /&gt;
\draw [arrow] (step18) -- (step19);&lt;br /&gt;
\draw [arrow] (step19) -- (step20);&lt;br /&gt;
\draw [arrow] (step20) -- (end);&lt;br /&gt;
&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&amp;lt;/PGFTikZ&amp;gt;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=561</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=561"/>
		<updated>2025-09-26T13:26:51Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==&lt;br /&gt;
&lt;br /&gt;
This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the TikZ code for generating a graphical flowchart. &#039;&#039;(Note: Requires a MediaWiki extension capable of rendering TikZ.)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&amp;lt;syntaxhighlight lang=&amp;quot;latex&amp;quot;&amp;gt;&lt;br /&gt;
\begin{tikzpicture}[node distance=0.7cm, auto]&lt;br /&gt;
% Define block styles&lt;br /&gt;
\tikzstyle{startstop} = [rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30]&lt;br /&gt;
\tikzstyle{process} = [rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20]&lt;br /&gt;
\tikzstyle{arrow} = [thick,-&amp;gt;,&amp;gt;=stealth]&lt;br /&gt;
&lt;br /&gt;
% Place nodes&lt;br /&gt;
\node (start) [startstop] {&#039;&#039;&#039;Wafer Start&#039;&#039;&#039; (P-type Silicon Substrate)};&lt;br /&gt;
\node (step1) [process, below=of start] {&#039;&#039;&#039;1. Initial Alignment&#039;&#039;&#039; (Mask: &#039;&#039;basic&#039;&#039;)};&lt;br /&gt;
\node (step2) [process, below=of step1] {&#039;&#039;&#039;2. Shallow Trench Isolation (STI)&#039;&#039;&#039; (Mask: &#039;&#039;sti&#039;&#039;)};&lt;br /&gt;
\node (step3) [process, below=of step2] {&#039;&#039;&#039;3. N-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;nwell&#039;&#039;)};&lt;br /&gt;
\node (step4) [process, below=of step3] {&#039;&#039;&#039;4. P-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;pwell&#039;&#039;)};&lt;br /&gt;
\node (step5) [process, below=of step4] {&#039;&#039;&#039;5. P-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;pbase&#039;&#039;)};&lt;br /&gt;
\node (step6) [process, below=of step5] {&#039;&#039;&#039;6. N-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;nbase&#039;&#039;)};&lt;br /&gt;
\node (step7) [process, below=of step6] {&#039;&#039;&#039;7. Field Oxide&#039;&#039;&#039; (Mask: &#039;&#039;fox&#039;&#039;)};&lt;br /&gt;
\node (step8) [process, below=of step7] {&#039;&#039;&#039;8. SONOS Flash Cell Formation&#039;&#039;&#039; (Mask: &#039;&#039;sonos&#039;&#039;)};&lt;br /&gt;
\node (step9) [process, below=of step8] {&#039;&#039;&#039;9. Gate Formation&#039;&#039;&#039; (Mask: &#039;&#039;poly&#039;&#039;)};&lt;br /&gt;
\node (step10) [process, below=of step9] {&#039;&#039;&#039;10. Implant Stop Layer&#039;&#039;&#039; (Mask: &#039;&#039;implantstop&#039;&#039;)};&lt;br /&gt;
\node (step11) [process, below=of step10] {&#039;&#039;&#039;11. N+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;nimplant&#039;&#039;)};&lt;br /&gt;
\node (step12) [process, below=of step11] {&#039;&#039;&#039;12. P+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;pimplant&#039;&#039;)};&lt;br /&gt;
\node (step13) [process, below=of step12] {&#039;&#039;&#039;13. Silicidation&#039;&#039;&#039; (Mask: &#039;&#039;silicideblock&#039;&#039;)};&lt;br /&gt;
\node (step14) [process, below=of step13] {&#039;&#039;&#039;14. Contact Layer&#039;&#039;&#039; (Mask: &#039;&#039;contact&#039;&#039;)};&lt;br /&gt;
\node (step15) [process, below=of step14] {&#039;&#039;&#039;15. Metal 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal1&#039;&#039;)};&lt;br /&gt;
\node (step16) [process, below=of step15] {&#039;&#039;&#039;16. Via 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via1&#039;&#039;)};&lt;br /&gt;
\node (step17) [process, below=of step16] {&#039;&#039;&#039;17. Metal 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal2&#039;&#039;)};&lt;br /&gt;
\node (step18) [process, below=of step17] {&#039;&#039;&#039;18. Via 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via2&#039;&#039;)};&lt;br /&gt;
\node (step19) [process, below=of step18] {&#039;&#039;&#039;19. Metal 3 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal3&#039;&#039;)};&lt;br /&gt;
\node (step20) [process, below=of step19] {&#039;&#039;&#039;20. Passivation (Glass)&#039;&#039;&#039; (Mask: &#039;&#039;glass&#039;&#039;)};&lt;br /&gt;
\node (end) [startstop, below=of step20] {&#039;&#039;&#039;Process End&#039;&#039;&#039;};&lt;br /&gt;
&lt;br /&gt;
% Draw arrows&lt;br /&gt;
\draw [arrow] (start) -- (step1);&lt;br /&gt;
\draw [arrow] (step1) -- (step2);&lt;br /&gt;
\draw [arrow] (step2) -- (step3);&lt;br /&gt;
\draw [arrow] (step3) -- (step4);&lt;br /&gt;
\draw [arrow] (step4) -- (step5);&lt;br /&gt;
\draw [arrow] (step5) -- (step6);&lt;br /&gt;
\draw [arrow] (step6) -- (step7);&lt;br /&gt;
\draw [arrow] (step7) -- (step8);&lt;br /&gt;
\draw [arrow] (step8) -- (step9);&lt;br /&gt;
\draw [arrow] (step9) -- (step10);&lt;br /&gt;
\draw [arrow] (step10) -- (step11);&lt;br /&gt;
\draw [arrow] (step11) -- (step12);&lt;br /&gt;
\draw [arrow] (step12) -- (step13);&lt;br /&gt;
\draw [arrow] (step13) -- (step14);&lt;br /&gt;
\draw [arrow] (step14) -- (step15);&lt;br /&gt;
\draw [arrow] (step15) -- (step16);&lt;br /&gt;
\draw [arrow] (step16) -- (step17);&lt;br /&gt;
\draw [arrow] (step17) -- (step18);&lt;br /&gt;
\draw [arrow] (step18) -- (step19);&lt;br /&gt;
\draw [arrow] (step19) -- (step20);&lt;br /&gt;
\draw [arrow] (step20) -- (end);&lt;br /&gt;
&lt;br /&gt;
\end{tikzpicture}&lt;br /&gt;
&amp;lt;/syntaxhighlight&amp;gt;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=560</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=560"/>
		<updated>2025-09-26T13:25:52Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== LibreSilicon 1µm CMOS Process Flow (HKUST NFF) ==This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.== General Manufacturing Steps ==The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.== Process Flowchart ==The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is the TikZ code for generating a graphical flowchart. &#039;&#039;(Note: Requires a MediaWiki extension capable of rendering TikZ.)&#039;&#039;&amp;lt;syntaxhighlight lang=&amp;quot;latex&amp;quot;&amp;gt;\begin{tikzpicture}[node distance=0.7cm, auto]% Define block styles\tikzstyle{startstop} = [rectangle, rounded corners, minimum width=4cm, minimum height=1cm, text centered, draw=black, fill=green!30]\tikzstyle{process} = [rectangle, minimum width=4cm, text width=6cm, minimum height=1cm, text centered, draw=black, fill=blue!20]\tikzstyle{arrow} = [thick,-&amp;gt;,&amp;gt;=stealth]% Place nodes&lt;br /&gt;
\node (start) [startstop] {&#039;&#039;&#039;Wafer Start&#039;&#039;&#039; (P-type Silicon Substrate)};&lt;br /&gt;
\node (step1) [process, below=of start] {&#039;&#039;&#039;1. Initial Alignment&#039;&#039;&#039; (Mask: &#039;&#039;basic&#039;&#039;)};&lt;br /&gt;
\node (step2) [process, below=of step1] {&#039;&#039;&#039;2. Shallow Trench Isolation (STI)&#039;&#039;&#039; (Mask: &#039;&#039;sti&#039;&#039;)};&lt;br /&gt;
\node (step3) [process, below=of step2] {&#039;&#039;&#039;3. N-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;nwell&#039;&#039;)};&lt;br /&gt;
\node (step4) [process, below=of step3] {&#039;&#039;&#039;4. P-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;pwell&#039;&#039;)};&lt;br /&gt;
\node (step5) [process, below=of step4] {&#039;&#039;&#039;5. P-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;pbase&#039;&#039;)};&lt;br /&gt;
\node (step6) [process, below=of step5] {&#039;&#039;&#039;6. N-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;nbase&#039;&#039;)};&lt;br /&gt;
\node (step7) [process, below=of step6] {&#039;&#039;&#039;7. Field Oxide&#039;&#039;&#039; (Mask: &#039;&#039;fox&#039;&#039;)};&lt;br /&gt;
\node (step8) [process, below=of step7] {&#039;&#039;&#039;8. SONOS Flash Cell Formation&#039;&#039;&#039; (Mask: &#039;&#039;sonos&#039;&#039;)};&lt;br /&gt;
\node (step9) [process, below=of step8] {&#039;&#039;&#039;9. Gate Formation&#039;&#039;&#039; (Mask: &#039;&#039;poly&#039;&#039;)};&lt;br /&gt;
\node (step10) [process, below=of step9] {&#039;&#039;&#039;10. Implant Stop Layer&#039;&#039;&#039; (Mask: &#039;&#039;implantstop&#039;&#039;)};&lt;br /&gt;
\node (step11) [process, below=of step10] {&#039;&#039;&#039;11. N+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;nimplant&#039;&#039;)};&lt;br /&gt;
\node (step12) [process, below=of step11] {&#039;&#039;&#039;12. P+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;pimplant&#039;&#039;)};&lt;br /&gt;
\node (step13) [process, below=of step12] {&#039;&#039;&#039;13. Silicidation&#039;&#039;&#039; (Mask: &#039;&#039;silicideblock&#039;&#039;)};&lt;br /&gt;
\node (step14) [process, below=of step13] {&#039;&#039;&#039;14. Contact Layer&#039;&#039;&#039; (Mask: &#039;&#039;contact&#039;&#039;)};&lt;br /&gt;
\node (step15) [process, below=of step14] {&#039;&#039;&#039;15. Metal 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal1&#039;&#039;)};&lt;br /&gt;
\node (step16) [process, below=of step15] {&#039;&#039;&#039;16. Via 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via1&#039;&#039;)};&lt;br /&gt;
\node (step17) [process, below=of step16] {&#039;&#039;&#039;17. Metal 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal2&#039;&#039;)};&lt;br /&gt;
\node (step18) [process, below=of step17] {&#039;&#039;&#039;18. Via 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via2&#039;&#039;)};&lt;br /&gt;
\node (step19) [process, below=of step18] {&#039;&#039;&#039;19. Metal 3 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal3&#039;&#039;)};&lt;br /&gt;
\node (step20) [process, below=of step19] {&#039;&#039;&#039;20. Passivation (Glass)&#039;&#039;&#039; (Mask: &#039;&#039;glass&#039;&#039;)};&lt;br /&gt;
\node (end) [startstop, below=of step20] {&#039;&#039;&#039;Process End&#039;&#039;&#039;};&lt;br /&gt;
&lt;br /&gt;
% Draw arrows&lt;br /&gt;
\draw [arrow] (start) -- (step1);&lt;br /&gt;
\draw [arrow] (step1) -- (step2);&lt;br /&gt;
\draw [arrow] (step2) -- (step3);&lt;br /&gt;
\draw [arrow] (step3) -- (step4);&lt;br /&gt;
\draw [arrow] (step4) -- (step5);&lt;br /&gt;
\draw [arrow] (step5) -- (step6);&lt;br /&gt;
\draw [arrow] (step6) -- (step7);&lt;br /&gt;
\draw [arrow] (step7) -- (step8);&lt;br /&gt;
\draw [arrow] (step8) -- (step9);&lt;br /&gt;
\draw [arrow] (step9) -- (step10);&lt;br /&gt;
\draw [arrow] (step10) -- (step11);&lt;br /&gt;
\draw [arrow] (step11) -- (step12);&lt;br /&gt;
\draw [arrow] (step12) -- (step13);&lt;br /&gt;
\draw [arrow] (step13) -- (step14);&lt;br /&gt;
\draw [arrow] (step14) -- (step15);&lt;br /&gt;
\draw [arrow] (step15) -- (step16);&lt;br /&gt;
\draw [arrow] (step16) -- (step17);&lt;br /&gt;
\draw [arrow] (step17) -- (step18);&lt;br /&gt;
\draw [arrow] (step18) -- (step19);&lt;br /&gt;
\draw [arrow] (step19) -- (step20);&lt;br /&gt;
\draw [arrow] (step20) -- (end);&lt;br /&gt;
\end{tikzpicture}&amp;lt;/syntaxhighlight&amp;gt;=== Step 1: Initial Alignment ===An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.=== Step 2: Shallow Trench Isolation (STI) ===This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.=== Step 7: Field Oxide (FOX) ===A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.=== Step 8: SONOS Formation ===This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.=== Step 9: Gate Formation ===This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.=== Step 10: Implant Stop Layer ===An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.=== Step 13: Silicidation ===A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).=== Step 14: Contact Layer ===An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===This is the &amp;quot;wiring&amp;quot; phase of the chip.*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.=== Step 20: Passivation (Glass) ===A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=559</id>
		<title>LibreSilicon 1µm CMOS Process Flow (HKUST NFF)</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=LibreSilicon_1%C2%B5m_CMOS_Process_Flow_(HKUST_NFF)&amp;diff=559"/>
		<updated>2025-09-26T13:21:12Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: Created page with &amp;quot;This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &amp;#039;&amp;#039;&amp;#039;gate-first&amp;#039;&amp;#039;&amp;#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.  The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.  == General Manuf...&amp;quot;&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;This document outlines the 1µm CMOS manufacturing process designed for the Hong Kong University of Science and Technology (HKUST) Nanoelectronics Fabrication Facility (NFF). It is a &#039;&#039;&#039;gate-first&#039;&#039;&#039; process utilizing polysilicon for the gate electrode and a shallow trench isolation (STI) approach for device isolation.&lt;br /&gt;
&lt;br /&gt;
The process is designed for manufacturing the LibreSilicon standard logic cells and is licensed under the Libre Silicon public license.&lt;br /&gt;
&lt;br /&gt;
== General Manufacturing Steps ==&lt;br /&gt;
The entire fabrication process consists of a sequence of fundamental steps that are repeated in various combinations to build the device layers. The core steps include:&lt;br /&gt;
&lt;br /&gt;
*&#039;&#039;&#039;Cleaning:&#039;&#039;&#039; Wafers are rigorously cleaned at the beginning of and between major processing stages to remove any particulate or chemical contaminants that could cause defects. This typically involves wet chemical baths (e.g., Sulfuric Peroxide Mix - SPM) and rinsing with deionized water.&lt;br /&gt;
*&#039;&#039;&#039;Photolithography:&#039;&#039;&#039; This is the process of transferring a pattern from a photomask to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Coating:&#039;&#039;&#039; A light-sensitive material called photoresist is evenly applied to the wafer surface.&lt;br /&gt;
**# &#039;&#039;&#039;Exposure:&#039;&#039;&#039; The wafer is exposed to UV light through a photomask containing the desired pattern. The light alters the chemical structure of the photoresist.&lt;br /&gt;
**# &#039;&#039;&#039;Development:&#039;&#039;&#039; A developer solution is used to remove either the exposed or unexposed portions of the photoresist, leaving the desired pattern on the wafer.&lt;br /&gt;
*&#039;&#039;&#039;Etching:&#039;&#039;&#039; Material is selectively removed from the wafer. This can be done through:&lt;br /&gt;
**# &#039;&#039;&#039;Dry Etching:&#039;&#039;&#039; Using plasmas or reactive gases to remove material (e.g., Reactive Ion Etching - RIE). This method is anisotropic, meaning it etches vertically, creating well-defined features.&lt;br /&gt;
**# &#039;&#039;&#039;Wet Etching:&#039;&#039;&#039; Using liquid chemicals to remove material. This is often isotropic, etching in all directions.&lt;br /&gt;
*&#039;&#039;&#039;Deposition:&#039;&#039;&#039; Thin films of various materials (insulators, conductors, semiconductors) are deposited onto the wafer. Common methods include:&lt;br /&gt;
**# &#039;&#039;&#039;Chemical Vapor Deposition (CVD):&#039;&#039;&#039; A chemical process that deposits a thin film from a vapor or gas state (e.g., LPCVD for silicon nitride or LTO).&lt;br /&gt;
**# &#039;&#039;&#039;Sputtering:&#039;&#039;&#039; A physical vapor deposition method where atoms are ejected from a target material and deposited onto the wafer, commonly used for metals.&lt;br /&gt;
*&#039;&#039;&#039;Ion Implantation:&#039;&#039;&#039; Dopant ions (like Boron for p-type or Phosphorus for n-type) are accelerated and embedded into the silicon substrate to precisely control its electrical properties. The patterned photoresist acts as a mask, blocking ions from certain areas.&lt;br /&gt;
*&#039;&#039;&#039;Thermal Processing (Annealing/Oxidation):&#039;&#039;&#039; The wafer is heated in a furnace for several reasons:&lt;br /&gt;
**# &#039;&#039;&#039;Drive-in/Annealing:&#039;&#039;&#039; To activate the implanted dopants and repair any crystal lattice damage caused by implantation.&lt;br /&gt;
**# &#039;&#039;&#039;Oxidation:&#039;&#039;&#039; To grow a high-quality layer of silicon dioxide (SiO₂) on the silicon surface, which is used for insulation and as a gate dielectric.&lt;br /&gt;
*&#039;&#039;&#039;Chemical Mechanical Planarization (CMP):&#039;&#039;&#039; This process uses a chemical slurry and mechanical polishing to flatten the wafer surface after deposition steps. A flat surface is crucial for the accuracy of subsequent photolithography steps.&lt;br /&gt;
&lt;br /&gt;
== Process Flowchart ==&lt;br /&gt;
The overall manufacturing process is a sequence of layering, patterning, and doping steps. Below is a high-level flowchart of the major stages.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Wafer Start&#039;&#039;&#039; (P-type Silicon Substrate)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;1. Initial Alignment&#039;&#039;&#039; (Mask: &#039;&#039;basic&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;2. Shallow Trench Isolation (STI)&#039;&#039;&#039; (Mask: &#039;&#039;sti&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;3. N-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;nwell&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;4. P-Well Formation&#039;&#039;&#039; (Mask: &#039;&#039;pwell&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;5. P-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;pbase&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;6. N-Base Implant&#039;&#039;&#039; (Mask: &#039;&#039;nbase&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;7. Field Oxide&#039;&#039;&#039; (Mask: &#039;&#039;fox&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;8. SONOS Flash Cell Formation&#039;&#039;&#039; (Mask: &#039;&#039;sonos&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;9. Gate Formation&#039;&#039;&#039; (Mask: &#039;&#039;poly&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;10. Implant Stop Layer&#039;&#039;&#039; (Mask: &#039;&#039;implantstop&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;11. N+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;nimplant&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;12. P+ Source/Drain Implant&#039;&#039;&#039; (Mask: &#039;&#039;pimplant&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;13. Silicidation&#039;&#039;&#039; (Mask: &#039;&#039;silicideblock&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;14. Contact Layer&#039;&#039;&#039; (Mask: &#039;&#039;contact&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;15. Metal 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal1&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;16. Via 1 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via1&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;17. Metal 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal2&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;18. Via 2 Layer&#039;&#039;&#039; (Mask: &#039;&#039;via2&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;19. Metal 3 Layer&#039;&#039;&#039; (Mask: &#039;&#039;metal3&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;20. Passivation (Glass)&#039;&#039;&#039; (Mask: &#039;&#039;glass&#039;&#039;)&lt;br /&gt;
↓&lt;br /&gt;
&#039;&#039;&#039;Process End&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
=== Step 1: Initial Alignment ===&lt;br /&gt;
An alignment pattern is etched into the wafer. This initial mask provides reference marks for the stepper to align all subsequent masks accurately.&lt;br /&gt;
&lt;br /&gt;
=== Step 2: Shallow Trench Isolation (STI) ===&lt;br /&gt;
This step creates electrical isolation between adjacent devices to prevent current leakage. Trenches are etched into the silicon, filled with silicon dioxide (an insulator), and the surface is then flattened using CMP.&lt;br /&gt;
&lt;br /&gt;
=== Step 3 &amp;amp; 4: N-Well &amp;amp; P-Well Formation ===&lt;br /&gt;
The substrate is selectively doped to create N-wells and P-wells. These wells are the regions where the PMOS and NMOS transistors will be built, respectively. This involves photolithography followed by ion implantation of Phosphorus (for N-well) and Boron (for P-well). The wells are then driven deeper into the substrate through an annealing process.&lt;br /&gt;
&lt;br /&gt;
=== Step 5 &amp;amp; 6: P-Base &amp;amp; N-Base Formation ===&lt;br /&gt;
These steps involve further implants to create the base regions for Bipolar Junction Transistors (BJTs) that can be integrated alongside the CMOS transistors.&lt;br /&gt;
&lt;br /&gt;
=== Step 7: Field Oxide (FOX) ===&lt;br /&gt;
A layer of oxide is deposited over regions of the wafer that are not part of the active transistor areas. This thick oxide further isolates devices.&lt;br /&gt;
&lt;br /&gt;
=== Step 8: SONOS Formation ===&lt;br /&gt;
This sequence of depositions (Silicon-Oxide-Nitride-Oxide-Silicon) creates the gate stack for SONOS non-volatile memory (flash) cells. This step is only performed in the areas where flash cells are desired.&lt;br /&gt;
&lt;br /&gt;
=== Step 9: Gate Formation ===&lt;br /&gt;
This is a critical step where the transistor gate is formed. A thin, high-quality gate oxide is grown on the active areas, followed by the deposition of polysilicon, which will act as the gate electrode. The polysilicon and gate oxide are then etched using the &#039;&#039;poly&#039;&#039; mask to define the gate structures.&lt;br /&gt;
&lt;br /&gt;
=== Step 10: Implant Stop Layer ===&lt;br /&gt;
An oxide layer is deposited and patterned. This layer protects certain areas of the device during the subsequent source and drain implantation steps.&lt;br /&gt;
&lt;br /&gt;
=== Step 11 &amp;amp; 12: N+ and P+ Source/Drain Implantation ===&lt;br /&gt;
The source and drain regions for the NMOS and PMOS transistors are created. Using photolithography to protect the other transistor type, the wafer is subjected to a high-dose ion implantation of Phosphorus (for N+) and Boron (for P+). The gate structure itself acts as a mask, ensuring the source and drain are perfectly aligned to the gate (self-aligned process). A final anneal activates these dopants.&lt;br /&gt;
&lt;br /&gt;
=== Step 13: Silicidation ===&lt;br /&gt;
A layer of metal (Titanium) is deposited and heated. The metal reacts with the exposed silicon on the gate, source, and drain regions to form a metal silicide (Titanium Silicide). This reduces the contact resistance of these regions, improving transistor performance. A blocking mask prevents this formation where it&#039;s not wanted (e.g., for polyresistors).&lt;br /&gt;
&lt;br /&gt;
=== Step 14: Contact Layer ===&lt;br /&gt;
An insulating layer (oxide) is deposited over the entire wafer (Pre-Metal Dielectric or PMD). It is then planarized with CMP. Photolithography and etching are used to create small holes, or &amp;quot;contacts,&amp;quot; through the insulator to the silicided gate and source/drain regions below.&lt;br /&gt;
&lt;br /&gt;
=== Step 15-19: Metallization (Metal 1-3 &amp;amp; Vias 1-2) ===&lt;br /&gt;
This is the &amp;quot;wiring&amp;quot; phase of the chip.&lt;br /&gt;
*&#039;&#039;&#039;Metal Layers:&#039;&#039;&#039; A layer of metal (Aluminum with Nickel barriers) is sputtered over the wafer, filling the contact holes. The metal is then patterned and etched to form the first layer of interconnects (wires).&lt;br /&gt;
*&#039;&#039;&#039;Via Layers:&#039;&#039;&#039; An insulating oxide is deposited and planarized. Vias (similar to contacts) are etched to connect to the metal layer below. The process is then repeated for subsequent metal layers (Metal 2, Metal 3), building up a complex, multi-level wiring structure that connects the millions of transistors on the chip.&lt;br /&gt;
&lt;br /&gt;
=== Step 20: Passivation (Glass) ===&lt;br /&gt;
A final, thick insulating layer (passivation) is deposited over the entire chip. This layer, typically silicon dioxide or silicon nitride, protects the device from moisture, contamination, and physical damage. The &#039;&#039;glass&#039;&#039; mask is used to etch openings over the metal pads, allowing for external connections (wire bonding) to the chip.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pearl_River&amp;diff=558</id>
		<title>Pearl River</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pearl_River&amp;diff=558"/>
		<updated>2025-09-26T13:20:43Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;Hand crafted test structures&lt;br /&gt;
&lt;br /&gt;
Manufactured with the [[LibreSilicon 1µm CMOS Process Flow (HKUST NFF)]]&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=StdCellLib&amp;diff=557</id>
		<title>StdCellLib</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=StdCellLib&amp;diff=557"/>
		<updated>2025-09-25T17:01:21Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;The Standard Cell Library generator has the function of generating a set of logic gates for any given VLSI process node by feeding it the relevant design rules for calculating the dimension and performing the place and route of the relevant transistors, so that a layout can be generated using the synthesis flow provided by [https://github.com/the-openroad-project OpenROAD].&lt;br /&gt;
&lt;br /&gt;
The development of this tool has been mainly funded by NLNet (https://nlnet.nl/project/LibreSiliconStandardCellLibrary/) as well as Google.&lt;br /&gt;
&lt;br /&gt;
An overview of all the cells available for generation can be found here: [[StdCellLib CellLibraries]]&lt;br /&gt;
&lt;br /&gt;
== Running the generator ==&lt;br /&gt;
First clone the repository&lt;br /&gt;
 git clone https://github.com/thesourcerer8/StdCellLib.git&lt;br /&gt;
 cd StdCellLib.git&lt;br /&gt;
Then you fetch the Dockerimage with all the LibreSilicon tools preinstalled, just as with DanubeRiver:&lt;br /&gt;
 docker pull leviathanch/libresilicon-tools:latest&lt;br /&gt;
Then you&#039;ve got to start the Docker container and build the standard cell library for your specific process&lt;br /&gt;
 xhost +local:docker&lt;br /&gt;
 docker run -e DISPLAY=$DISPLAY -v /tmp/.X11-unix:/tmp/.X11-unix -v `pwd`:/work -it leviathanch/libresilicon-tools&lt;br /&gt;
 cd Catalog&lt;br /&gt;
 make layout&lt;br /&gt;
Your resulting GDS2 files and other library formats can afterwards be found in &amp;quot;/work/Catalog/outputlib&amp;quot;&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=StdCellLib&amp;diff=556</id>
		<title>StdCellLib</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=StdCellLib&amp;diff=556"/>
		<updated>2025-09-25T17:00:58Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;The Standard Cell Library generator has the function of generating a set of logic gates for any given VLSI process node by feeding it the relevant design rules for calculating the dimension and performing the place and route of the relevant transistors, so that a layout can be generated using the synthesis flow provided by [https://github.com/the-openroad-project OpenROAD].&lt;br /&gt;
&lt;br /&gt;
The development of this tool has been mainly funded by NLNet (https://nlnet.nl/project/LibreSiliconStandardCellLibrary/) as well as Google.&lt;br /&gt;
&lt;br /&gt;
An overview of all the cells available for generation can be found here: [[StdCellLib CellLibraries]]&lt;br /&gt;
&lt;br /&gt;
First clone the repository&lt;br /&gt;
 git clone https://github.com/thesourcerer8/StdCellLib.git&lt;br /&gt;
 cd StdCellLib.git&lt;br /&gt;
Then you fetch the Dockerimage with all the LibreSilicon tools preinstalled, just as with DanubeRiver:&lt;br /&gt;
 docker pull leviathanch/libresilicon-tools:latest&lt;br /&gt;
Then you&#039;ve got to start the Docker container and build the standard cell library for your specific process&lt;br /&gt;
 xhost +local:docker&lt;br /&gt;
 docker run -e DISPLAY=$DISPLAY -v /tmp/.X11-unix:/tmp/.X11-unix -v `pwd`:/work -it leviathanch/libresilicon-tools&lt;br /&gt;
 cd Catalog&lt;br /&gt;
 make layout&lt;br /&gt;
Your resulting GDS2 files and other library formats can afterwards be found in &amp;quot;/work/Catalog/outputlib&amp;quot;&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=554</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=554"/>
		<updated>2025-09-21T19:13:27Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Transmission gate */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
[[File:Inverter.png|none|thumb|An Inverter gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;2&amp;quot; | Inverter truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|colspan=1|&#039;&#039;&#039;Input&#039;&#039;&#039; || &#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| A || NOT A&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Transmission gate ==&lt;br /&gt;
The transmission gate has the purpose of making sure that the input signal is being shifted to the logic levels of the internal logic, for instance 3V3 external logic levels to 1V8 internal logic.&lt;br /&gt;
[[File:Transmission gate.png|none|thumb|Transmission Gate Schematics]]&lt;br /&gt;
In addition, it contains additional polarity, over voltage and current protection.&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
[[File:Output Driver.png|none|thumb|Driver Circuit Schematic]]&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
In the schematic above, the output transistors M7 and M8 are responsible for ultimately driving the loads attached to a pad and as such will be much larger than their driving transistors (M1=M6)&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=File:Transmission_gate.png&amp;diff=553</id>
		<title>File:Transmission gate.png</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=File:Transmission_gate.png&amp;diff=553"/>
		<updated>2025-09-21T19:12:52Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;Transmission gate schematics&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=552</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=552"/>
		<updated>2025-09-20T20:22:22Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Driver circuit */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
[[File:Inverter.png|none|thumb|An Inverter gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;2&amp;quot; | Inverter truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|colspan=1|&#039;&#039;&#039;Input&#039;&#039;&#039; || &#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| A || NOT A&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Transmission gate ==&lt;br /&gt;
The transmission gate has the purpose of making sure that the input signal is being shifted to the logic levels of the internal logic, for instance 3V3 external logic levels to 1V8 internal logic.&lt;br /&gt;
&lt;br /&gt;
In addition, it contains additional polarity, over voltage and current protection.&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
[[File:Output Driver.png|none|thumb|Driver Circuit Schematic]]&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
In the schematic above, the output transistors M7 and M8 are responsible for ultimately driving the loads attached to a pad and as such will be much larger than their driving transistors (M1=M6)&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=551</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=551"/>
		<updated>2025-09-20T20:20:14Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Driver circuit */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
[[File:Inverter.png|none|thumb|An Inverter gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;2&amp;quot; | Inverter truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|colspan=1|&#039;&#039;&#039;Input&#039;&#039;&#039; || &#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| A || NOT A&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Transmission gate ==&lt;br /&gt;
The transmission gate has the purpose of making sure that the input signal is being shifted to the logic levels of the internal logic, for instance 3V3 external logic levels to 1V8 internal logic.&lt;br /&gt;
&lt;br /&gt;
In addition, it contains additional polarity, over voltage and current protection.&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
[[File:Output Driver.png|none|thumb|Driver Circuit Schematic]]&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=File:Output_Driver.png&amp;diff=550</id>
		<title>File:Output Driver.png</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=File:Output_Driver.png&amp;diff=550"/>
		<updated>2025-09-20T20:19:24Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;Driver circuit&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=549</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=549"/>
		<updated>2025-09-20T20:18:11Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Transmission gate */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
[[File:Inverter.png|none|thumb|An Inverter gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;2&amp;quot; | Inverter truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|colspan=1|&#039;&#039;&#039;Input&#039;&#039;&#039; || &#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| A || NOT A&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Transmission gate ==&lt;br /&gt;
The transmission gate has the purpose of making sure that the input signal is being shifted to the logic levels of the internal logic, for instance 3V3 external logic levels to 1V8 internal logic.&lt;br /&gt;
&lt;br /&gt;
In addition, it contains additional polarity, over voltage and current protection.&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=548</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=548"/>
		<updated>2025-09-20T19:54:25Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
[[File:Inverter.png|none|thumb|An Inverter gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;2&amp;quot; | Inverter truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|colspan=1|&#039;&#039;&#039;Input&#039;&#039;&#039; || &#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| A || NOT A&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Transmission gate ==&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=547</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=547"/>
		<updated>2025-09-20T19:53:22Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* INV (Inverter) */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
[[File:Inverter.png|none|thumb|An Inverter gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;2&amp;quot; | Inverter truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|colspan=1|&#039;&#039;&#039;Input&#039;&#039;&#039; || &#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| A || NOT A&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=546</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=546"/>
		<updated>2025-09-20T19:53:06Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* INV (Inverter) */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
[[File:Inverter.png|none|thumb|An Inverter gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;2&amp;quot; | Inverter [[truth table]]&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|colspan=1|&#039;&#039;&#039;Input&#039;&#039;&#039; || &#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| A || NOT A&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=545</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=545"/>
		<updated>2025-09-20T19:52:20Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* INV (Inverter) */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
[[File:Inverter.png|none|thumb|An Inverter gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable floatright&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;2&amp;quot; | Inverter [[truth table]]&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|colspan=1|&#039;&#039;&#039;Input&#039;&#039;&#039; || &#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| A || NOT A&lt;br /&gt;
|-&lt;br /&gt;
|{{no2|0}}&lt;br /&gt;
|{{yes2|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{yes2|1}}&lt;br /&gt;
|{{no2|0}}&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=544</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=544"/>
		<updated>2025-09-20T19:51:56Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* INV (Inverter) */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
[[File:Inverter.png|none|thumb|An Inverter gate]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=File:Inverter.png&amp;diff=543</id>
		<title>File:Inverter.png</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=File:Inverter.png&amp;diff=543"/>
		<updated>2025-09-20T19:51:04Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;Inverter gate&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=542</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=542"/>
		<updated>2025-09-20T19:43:02Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* NAND2 (NAND gate) */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=541</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=541"/>
		<updated>2025-09-20T19:41:42Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* NAND2 (NAND gate) */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; | 0&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;| 0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; | 1&lt;br /&gt;
|-&lt;br /&gt;
|{{no2|0}}||{{yes2|1}}||{{yes2|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{yes2|1}}||{{no2|0}}||{{yes2|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{yes2|1}}||{{yes2|1}}||{{no2|0}}&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=540</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=540"/>
		<updated>2025-09-20T19:41:11Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* Driver Logic */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot; ||0&lt;br /&gt;
! style=&amp;quot;color:red&amp;quot;||0&lt;br /&gt;
! style=&amp;quot;color:green&amp;quot; ||1&lt;br /&gt;
|-&lt;br /&gt;
|{{no2|0}}||{{yes2|1}}||{{yes2|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{yes2|1}}||{{no2|0}}||{{yes2|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{yes2|1}}||{{yes2|1}}||{{no2|0}}&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=539</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=539"/>
		<updated>2025-09-20T19:37:27Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* NAND2 (NAND gate) */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
|{{no|0}}||{{no2|0}}||{{yes|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{no2|0}}||{{yes2|1}}||{{yes2|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{yes2|1}}||{{no2|0}}||{{yes2|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{yes2|1}}||{{yes2|1}}||{{no2|0}}&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=538</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=538"/>
		<updated>2025-09-20T19:34:36Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* NAND2 (NAND gate) */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
|{{no|0}}||{{no2|0}}||{{yes2|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{no2|0}}||{{yes2|1}}||{{yes2|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{yes2|1}}||{{no2|0}}||{{yes2|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{yes2|1}}||{{yes2|1}}||{{no2|0}}&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
	<entry>
		<id>https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=537</id>
		<title>Pad Cell</title>
		<link rel="alternate" type="text/html" href="https://wiki.libresilicon.com/index.php?title=Pad_Cell&amp;diff=537"/>
		<updated>2025-09-20T19:33:33Z</updated>

		<summary type="html">&lt;p&gt;Leviathan: /* INV (Inverter) */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A typical pad cell consists of driver logic, ESD protection and a bonding pad, which essentially just is a &amp;quot;large&amp;quot; metal square, big enough to fit a bonding ball needed to attach the bonding wire or solder it to a PCB (flip chip bonding) or onto another carrier substrate chip (chiplet assembly)&lt;br /&gt;
[[File:Padcell.png|none|thumb|302x302px|Pad Cell in Magic editor]]&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The schematic of the pad cell can generally be broken down into purely combinatory and active analog design components.[[File:Pad Cell Schematics.png|none|thumb|Pad Cell Schematics]]Where we have the two standard logic cells, and inverter and a NAND2 gate (red), transmission gate with level shifting (yellow), a tri-state driver, with 1, 0 and Z (high impedance).(green) and the transistors for pull up and pull down.&lt;br /&gt;
&lt;br /&gt;
== Driver Logic ==&lt;br /&gt;
This part of the pad cell is purely combinatorial, and controls based on its pins on the logic side where it&#039;s interfacing to the internal logic, what modes should be configured.&lt;br /&gt;
&lt;br /&gt;
For instance, whether the output is enabled, in which case it would either drive current through its driver circuit or pull down to ground in case pull down mode is being set from the internal logic.&lt;br /&gt;
&lt;br /&gt;
It can also be configured for high impedance input, in case OE is disabled.&lt;br /&gt;
&lt;br /&gt;
Various additional functions can be implemented, like for instance impedance and termination resistor calibration in case it&#039;s part of a DRAM or PCIe PHY.&lt;br /&gt;
&lt;br /&gt;
In short, the driver logic configures the actual physical properties of the pad depending on what the internal logic tells it to do:&lt;br /&gt;
&lt;br /&gt;
* Set transistors to either drive from the VCC rail to ground or switch towards ground&lt;br /&gt;
* Setting whether the driver should be active at all (Output Enable)&lt;br /&gt;
* Provide a state engine or other means for configuring the termination resistance to ground.&lt;br /&gt;
&lt;br /&gt;
=== INV (Inverter) ===&lt;br /&gt;
&lt;br /&gt;
=== NAND2 (NAND gate) ===&lt;br /&gt;
&lt;br /&gt;
[[File:NAND2 Gate.png|none|thumb|A NAND2 gate]]&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot; style=&amp;quot;text-align:center&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! colspan=&amp;quot;3&amp;quot; |NAND gate truth table&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
| colspan=&amp;quot;2&amp;quot; |&#039;&#039;&#039;Input&#039;&#039;&#039; ||&#039;&#039;&#039;Output&#039;&#039;&#039;&lt;br /&gt;
|- bgcolor=&amp;quot;#ddeeff&amp;quot;&lt;br /&gt;
|A||B||A NAND B&lt;br /&gt;
|-&lt;br /&gt;
|{{no2|0}}||{{no2|0}}||{{yes2|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{no2|0}}||{{yes2|1}}||{{yes2|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{yes2|1}}||{{no2|0}}||{{yes2|1}}&lt;br /&gt;
|-&lt;br /&gt;
|{{yes2|1}}||{{yes2|1}}||{{no2|0}}&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Driver circuit ==&lt;br /&gt;
Internally, transistors of a logic circuit only can drive a few micro amperes of current and are unable to survive driving a load like an LED.&lt;br /&gt;
&lt;br /&gt;
In order to make a chip do something useful driver circuits need to be implemented which can provide the power needed for actually driving loads like making an LED blink or driving a small DC motor.&lt;br /&gt;
&lt;br /&gt;
This is being done in the driver circuit through [[Fingered Transistors]] which turn the low power logic states at its inputs into a state which is useful to the outside world.&lt;br /&gt;
&lt;br /&gt;
== ESD protection ==&lt;br /&gt;
The figure below shows an example of the rail-based protection in which the primary dual diodes (D1 and D2), the secondary dual diodes (D3 and D4), the NMOSFET power supply clamp are employed.&lt;br /&gt;
&lt;br /&gt;
The power clamp provides a current path from the power supply pad to the ground pad during various ESD events.&lt;br /&gt;
&lt;br /&gt;
It&#039;s the simplest form of the RC-triggered power supply clamp, where the RC network and the inverter chain are designed such that the NMOSFET (M1) remains off during normal operation and turns on during an ESD event. This NMOSFET should be wide enough to handle the ESD current when it is on during an ESD event.&lt;br /&gt;
[[File:Rail-based ESD Protection.png|none|thumb|Concept of rail-based ESD Protection. ESD current is redirected to the VDD power rail and then shunted to GND by a power clamp.]]&lt;br /&gt;
An example layout found in one of the opened up PDKs available can be seen below&lt;br /&gt;
[[File:ESD layout.png|none|thumb|200x200px|Example ESD layout done in Magic]]Consult the following literature for more information: http://www-tcad.stanford.edu/tcad/pubs/theses/chun.pdf&lt;br /&gt;
&lt;br /&gt;
== Bonding pad ==&lt;br /&gt;
A bonding pad, unlike other components on an ASIC, do not scale down with the feature size, because their area is defined by the physical sizes of the physical solder ball and bonding wire, respectively the solder pads for flip chip bonding required.&lt;br /&gt;
[[File:Chip packaging.png|none|thumb|A drawing of wire bonding to a classical chip package works]]&lt;br /&gt;
Below an example the layout of one of the bonding pads in one of the open PDKs currently available can be seen.[[File:Bonding Pad.png|none|thumb|200x200px|Example bonding pad done in Magic]]The bonding pad usually is 120x120 and 200x200 microns in size, but there&#039;s packaging methods which require even larger pads, like for instance when performing flip chip bonding with a cheap substrate manufacturer.&lt;br /&gt;
&lt;br /&gt;
For flip chip bonding typically an additional layer with isolation oxide and tin pads will be added wiring the output pads to a pad array over the passivization oxide.&lt;/div&gt;</summary>
		<author><name>Leviathan</name></author>
	</entry>
</feed>