R&D challenge: Difference between revisions
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===Requirements=== | ===Requirements=== | ||
* Liquid material deposition | * Liquid material deposition | ||
* Can be done with lab furnace | * Can be done with lab furnace (preferably around 1200 degrees Celsius) | ||
[[File: | [[File:Labfurnace.png|500px]] | ||
* No chemicals which get your garage SWATed | * No chemicals which get your garage SWATed | ||
* Etching method should be provided which can be done in a garage | * Etching method should be provided which can be done in a garage | ||
===Possible Solutions=== | |||
* Can we use https://futurezone.at/science/computerchips-honig-memristor-washington-state-university-neuromorphes-computing/401967797 instead of polysilicon? | |||
* AI generated recipe: [[Eco friendly Polysilicon deposition (CVD)]] | |||
Latest revision as of 15:29, 17 May 2023
This side holds projects for which we welcome external help to contribute man power and machine access.
Polysilicon
Polysilicon is currently only done by using silane gas, which is highly poisonous and unfeasible for small scale manufacturing setups. We welcome the help from material science students and labs to come up with alternative recipes which require less poisonous gases or provide alternative chemical recipes for alternative gate materials with similar resistivity and temperature tolerance as polysilicon.
Requirements
- Liquid material deposition
- Can be done with lab furnace (preferably around 1200 degrees Celsius)
- No chemicals which get your garage SWATed
- Etching method should be provided which can be done in a garage
Possible Solutions
- Can we use https://futurezone.at/science/computerchips-honig-memristor-washington-state-university-neuromorphes-computing/401967797 instead of polysilicon?
- AI generated recipe: Eco friendly Polysilicon deposition (CVD)