Hafnium oxide deposition (CVD): Difference between revisions
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===Processing steps=== | |||
https://patents.google.com/patent/CN100356519C/en | |||
Revision as of 14:43, 11 October 2022
The base of this chemical recipe and processing is Hafnium-Tetrachloride, as it can be seen in the picture.
You might notice that Hafnium-Tetrachloride is a solid crystal at room temperature, which is kind of a problem considering that we wanna use it as a vapor in our CVD furnace, in order to react it with oxide for obtaining a Hafnium-Oxide thin film layer.
