Hafnium oxide deposition (CVD)
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The base of this chemical recipe and processing is Hafnium-Tetrachloride, as it can be seen in the picture.
You might notice that Hafnium-Tetrachloride is a solid crystal at room temperature, which is kind of a problem considering that we wanna use it as a vapor in our CVD furnace, in order to react it with oxide for obtaining a Hafnium-Oxide thin film layer.
