Hf precursor TDEAH (Hf(NEt2)4)

This is the structure of the organic precursor for Hafnium oxide deposition in a CVD (Hafnium_oxide_deposition_(CVD))

as described in the following Japanese paper

WARNING! This chemical reacts VIOLENTLY with water and humidity in general! Caution is required when dealing with it!

Atmospheric requirements

Since this mixture and its components react with oxygen and humidity, we need to use a Schlenk tube setup for mixing it, because we can only do it in an inert atmosphere.