Hafnium oxide deposition (CVD)

The equipment required for this process are a CVD and a plasma cleaner for removing impurities after the Hafnium oxide deposition

Processing steps

Since HfCl₄ is a solid salt at room temperature, we need to first create a liquid precursor, and use direct liquid injection for using it in our CVD.

The process is based on a Japanese paper and requires a complex precursor.

The synthesis of the Hf precursor TDEAH (Hf(NEt2)4) is so complex, that it needs its own page.

Links

Study HfO₂ formation: https://iopscience.iop.org/article/10.1149/MA2005-02/13/547/pdf

A Japanese paper how they grew it with an LPCVD: http://www.trichemical.com/topics/Manuscript%20revisions.pdf