High Contrast Resist v1
| Component Category | Specific Chemical | Function in Matrix | Weight Percentage (wt%) |
| Base Polymer Matrix | Standard 405nm SLA Resin (e.g., ABS-Like) | Provides acrylate monomers, oligomers, and TPO initiator for radical crosslinking upon exposure. | 25.0% - 30.0% |
| Primary Solvent | PGMEA (1-Methoxy-2-propanol acetate) | Diluent for reducing viscosity to ~10 cP; essential for achieving 1µm spin coating thickness. | 65.0% - 70.0% |
| Photoacid Generator (PAG) | Diphenyliodonium hexafluorophosphate | Ultimate electron acceptor; generates highly localized $H^+$ superacid upon sensitization. | 1.5% - 2.0% |
| Photosensitizer | ITX (2-Isopropylthioxanthone) | Absorbs 405nm photons, undergoes intersystem crossing, and transfers electrons to the PAG. | 0.5% - 1.0% |
| Color Former (Leuco Dye) | Crystal Violet Lactone (CVL) | Reacts with the photogenerated acid to undergo lactone ring opening, yielding strong 590nm absorbance. | 2.0% - 3.0% |