Chemical recipes

Poly silicon

Commonly Silane gas is being used in the industry for forming polysilicon. Unfortunately this gas is highly poisonous and as such unfeasible for small laboratory scale setups. This is why we're collecting alternative recipes here.

Currently we've got the polysilicon R&D challenge#Polysilicon going, for finding alternative recipes to form polysilicon without the need for the highly poisonous silane gas.

Doping

Alternatives to Boron and Phosphorus gas go here.

Hafnium oxide

There are two ways known so far, which allow for Hafnium oxide deposition, one is using a common CVD the other one is using metalorganic chemical vapour deposition (MOCVD)

For simplicity and cost reasons I've focused more on the CVD solution so far, because its chemicals required are easier to obtain and the process can be performed with a normal CVD furnace.

CVD method

https://aip.scitation.org/doi/10.1063/1.1495847 https://patents.google.com/patent/CN100356519C/en

MOCVD method

The chemical recipe and the process for the deposition and cleaning are based on the following publication https://patents.google.com/patent/KR100592793B1/en and this patent https://patents.google.com/patent/US7192623B2

The process is enough complex as to justify its own page, which can be found here Hafnium oxide deposition (MOCVD)