Eco friendly Polysilicon deposition (CVD)
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So we asked Bing AI to crawl the web for alternative solutions [1] [2]
- Prepare a silicon substrate by cleaning it with acetone and isopropanol, and then oxidizing it in a furnace at 1000°C for 30 minutes in an oxygen atmosphere
- Prepare a chemical system containing a water dispersible octadecylsilane-based chemical (such as Siliclad®) and a cationic surfactant (such as cetyltrimethylammonium bromide) in a solvent system containing a mixture of tertiary alcohols and diacetone alcohol. The concentration of the silane and the surfactant should be optimized according to the desired hydrophobicity and film thickness.
- Load the silicon substrate into the CVD chamber and heat it to 200°C.
- Introduce the chemical system into the CVD chamber as a vapor by using a bubbler or an ultrasonic nebulizer.
- Maintain the deposition for 10 minutes or until a uniform coating is formed on the substrate.
- Stop the deposition and purge the CVD chamber with nitrogen gas.
- Remove the substrate from the CVD chamber and cure it at 150°C for 30 minutes in air.