Hafnium oxide deposition (CVD)

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The equipment required for this process are a CVD and a plasma cleaner for removing impurities after the Hafnium oxide deposition

Since HfCl4 is a solid salt at room temperature, we need to first create a liquid precursor, and use direct liquid injection for using it in our CVD.

The process is based on a Japanese paper and requires a complex precursor.

The synthesis of the Hf precursor TDEAH (Hf(NEt2)4) is so complex, that it needs its own page.

Step 1

Synthesize the precursor Hf precursor TDEAH (Hf(NEt2)4) accordingly.

Step 2

HFO2 CVD setup.png

Pressure TDEAH.png


Links

Study HfO2 formation: https://iopscience.iop.org/article/10.1149/MA2005-02/13/547/pdf

A Japanese paper how they grew it with an LPCVD: http://www.trichemical.com/topics/Manuscript%20revisions.pdf