Hf precursor TDEAH (Hf(NEt2)4): Difference between revisions
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as described in the following [https://download.libresilicon.com/papers/HafniumOxide.pdf Japanese paper] | as described in the following [https://download.libresilicon.com/papers/HafniumOxide.pdf Japanese paper] | ||
<span style="color:red"><b>WARNING</b></span> | <span style="color:red"> | ||
<b>WARNING!</b> | |||
This chemical reacts VIOLENTLY with water and humidity in general! | |||
Caution is required when dealing with it! | |||
</span> | |||
Revision as of 13:41, 12 October 2022
This is the structure of the organic precursor for Hafnium oxide deposition in a CVD (Hafnium_oxide_deposition_(CVD))
as described in the following Japanese paper
WARNING! This chemical reacts VIOLENTLY with water and humidity in general! Caution is required when dealing with it!