Hf precursor TDEAH (Hf(NEt2)4): Difference between revisions

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HfCl<sub>4</sub> + Et<sub>2</sub>NLi
HfCl<sub>4</sub> + Et<sub>2</sub>NLi
 
TDEAH (Hf(NEt<sub>2</sub>)<sub>4</sub>)
TDEAH (Hf(NEt<sub>2</sub>)<sub>4</sub>)

Revision as of 13:48, 12 October 2022

This is the structure of the organic precursor for Hafnium oxide deposition in a CVD (Hafnium_oxide_deposition_(CVD))

TDEAH.png

as described in the following Japanese paper

WARNING! This chemical reacts VIOLENTLY with water and humidity in general! Caution is required when dealing with it!

Atmospheric requirements

Since this mixture and its components react with oxygen and humidity, we need to use a Schlenk tube setup for mixing it, because we can only do it in an inert atmosphere.

Chemical reaction

HfCl4 + Et2NLi

TDEAH (Hf(NEt2)4)